Laminate, electron source and electronic device containing laminate, and production method and cleaning method for laminate
AssigneeNational Institute for Materials Science
InventorsKatsumi Nagaoka, Takashi Aizawa, Shun-Ichiro Ohmi
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Abstract
The purpose of the present invention, relating to lanthanide boride, which is known as a low work function material, is to provide a novel low work function material with low chemical reactivity, in particular a low work function material of which the material surface, after being exposed to atmospheric gases, can be cleaned at a heating temperature lower than in the prior art. The present invention is a laminate containing a lanthanide boride film formed on a substrate, the surface of said film being covered by a thin film, wherein the thin film is a monatomic layer of a hexagonal boron nitride thin film.
Claims12
A laminate comprising a lanthanoid boride film formed on a substrate, wherein a surface of the lanthanoid boride film is coated with a thin film, and
- wherein the thin film is a monoatomic layer hexagonal boron nitride thin film.
A method for cleaning a laminate, comprising:
- exposing the laminate in which a surface of a lanthanoid boride film formed on a substrate is coated with a thin film made of monoatomic layer hexagonal boron nitride to an ambient gas, and then subjecting the laminate contaminated with the ambient gas to vacuum heating at a low temperature of 500° C. or higher and 600° C. or less to clean the laminate.
Dependencies are inferred from the claim text.