Plasma source Ion implanter with preparation chamber for linear or cross transferring workpiece

A plasma source ion implanter for linear transferring a workpiece comprises:

• a preparation chamber 1 being constructed with a double-layer wall, and a water inlet pipe and a water outlet pipe are arranged on the double-layer wall;
• a vacuum pumping system operatively connecting to the preparation chamber 1;
• a first workbench 10 rotatably disposed in the preparation chamber 1;
• a plurality of first stations 14 radially provided on the first workbench 10 at a position that the first stations 14 are arranged in a circular array;
• a first telescopic support member 18 having a rod shape, wherein an upper end portion of the first telescopic support rod 18 is extended to pass through a through hole formed at the first workbench 10 below the first station 14 to perpendicularly extend to the first workbench 10;
• a power switching device having an output end connecting to the first workbench 10 via electrodes and input ends respectively connecting with negative poles of the cleaning power supply and the implantation power supply, wherein the wall of the preparation chamber 1 is connected to positive poles of the cleaning power supply and the implantation power supply;
• a baking system and a radio frequency antenna are disposed in the preparation chamber 1, wherein the radio frequency antenna is connected to the radio frequency power supply outside the preparation chamber 1;
• a first workbench drive motor 101 located outside of the preparation chamber 1 for driving the first workbench 10 to rotate;
• an implantation chamber 2 being also constructed with the double-layer wall, and the water inlet pipe and the water outlet pipe are arranged on the double-layer wall, wherein the implantation chamber 2 is operatively connected to the vacuum pumping system;
• a second workbench 11 rotatably disposed in the implantation chamber 2;
• a plurality of second stations 15 radially provided on the second workbench 11 at a position that the second stations 15 are arranged in a circular array, wherein the number of the second stations 15 on the implantation chamber 2 is less than the number of the first stations 14 on the preparation chamber 1;
• a second telescopic support member 19 having a rod shape, wherein an upper end portion of the second telescopic support rod 19 is extended to pass through a through hole formed at the second workbench 11 below the second station 15 to perpendicularly extend to the second workbench 11, wherein the second workbench 11 is connected with the output end of the power switching device via the electrodes, while the input ends of the power switching device are respectively connected with the negative poles of the cleaning power supply and the implantation power supply, wherein the wall of the implantation chamber 2 is connected to the positive poles of the cleaning power supply and the implantation power supply, wherein the baking system and the radio frequency antenna are disposed at an upper portion of the implantation chamber 2, wherein the radio frequency antenna is connected to the radio frequency power supply outside the implantation chamber 2;
• a second table drive motor 111 located outside of the implantation chamber 2 for driving the second table 11 to rotate;
• a workpiece transferring chamber 3, wherein the preparation chamber 1 and the implantation chamber 2 are connected with each other through the workpiece transferring chamber 3, wherein the preparation chamber 1 and the implantation chamber 2 are symmetrically arranged on two opposed sides of the workpiece transferring chamber 3, such that the preparation chamber 1 and the implantation chamber 2 are linearly aligned with each other;
• a vacuum gate valve 6 operatively provided at a center of the workpiece transferring chamber 3;
• first and second transferring platforms 20, 21 provided at a mid-portion of the workpiece transferring chamber 3, wherein the first transferring platform 20 is located at one side of the vacuum gate valve 6 while the second transferring platform 21 is located at the opposed side of the vacuum gate valve 6, such that the vacuum gate valve 6 is located between the first and second transferring platforms 20, 21 of the workpiece transferring chamber 3;
• and
• a transferring rod 17 provided on the left side of the preparation chamber 1, wherein the first telescopic support member 18 is provided below the first worktable 10 while the second telescopic support member 19 is provided below the second worktable 11.