Measurement method, measurement device, measurement system, and measurement program
AssigneeSeiko Epson Corporation
InventorYoshihiro Kobayashi
Life of this patent
Estimating the term…
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AssigneeSeiko Epson Corporation
InventorYoshihiro Kobayashi
Estimating the term…
A measurement method includes: generating second measurement data by performing filter processing on first measurement data; calculating a first deflection amount based on an approximate equation of deflection of a structure; calculating a second deflection amount by performing filter processing on the first deflection amount; calculating a third deflection amount based on the second deflection amount and a first-order coefficient and a zero-order coefficient which are calculated based on the second measurement data and the second deflection amount; calculating an offset based on the zero-order coefficient, the second deflection amount, and the third deflection amount; calculating a static response by adding the offset and a product of the first-order coefficient and the first deflection amount; calculating a first dynamic response by subtracting the static response from the first measurement data; calculating a second dynamic response by attenuating an unnecessary signal from the first dynamic response; and calculating an attenuation rate of the second dynamic response based on an envelope amplitude of the second dynamic response.
A measurement method for causing a processor to execute a process, the method comprising executing on the processor the steps of:
A measurement device, comprising:
A non-transitory computer-readable storage medium storing a measurement program, the measurement program causing a computer to execute a process by a processor so as to perform the steps of:
Dependencies are inferred from the claim text.