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US 12,233,290 B2Granted
Multi-layer face mask
AssigneeNuGeneration Technologies, LLC
InventorDonato Polignone
Life of this patent
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Abstract
A face mask has a first woven filter layer comprising a first yarn and a second woven filter layer comprising a second yarn. The second yarn is disposed at a non-right and non-parallel angle relative to the first yarn. The second woven filter layer is stitched to the first woven filter layer. A third woven filter layer with a third yarn can be added with the third yarn at a non-right and non-parallel angle relative to both the first yarn and second yarn.
Claims20
A face mask, comprising:
- a first filter layer comprising a first yarn;
- and
- a second filter layer comprising a second yarn, wherein the second yarn is disposed at a non-right and non-parallel angle relative to the first yarn.
A filter media, comprising:
- a first filter layer disposed at a first angle;
- and
- a second filter layer disposed at a second angle different from the first angle.
A method of making a filter media, comprising:
- providing a first woven filter layer;
- providing a second woven filter layer;
- and
- disposing the second woven filter layer on the first woven filter layer with the second woven filter layer rotated relative to the first woven filter layer.
1 more element
Dependencies are inferred from the claim text.