Self-assembled guided hole and via patterning over grating
AssigneeIntel Corporation
InventorsFlorian Gstrein, Eungnak Han, Manish Chandhok, Gurpreet Singh
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AssigneeIntel Corporation
InventorsFlorian Gstrein, Eungnak Han, Manish Chandhok, Gurpreet Singh
Estimating the term…
Described herein are IC devices include vias deposited in a regular array, e.g., a hexagonal array, and processes for depositing vias in a regular array. The process includes depositing a guiding pattern over a metal grating, depositing a diblock copolymer over the guiding pattern, and causing the diblock copolymer to self-assemble such one polymer forms an array of cylinders over metal portions of the metal grating. The polymer layer can be converted into a hard mask layer, with one hard mask material forming the cylinders, and a different hard mask material surrounding the cylinders. A cylinder can be selectively etched, and a via material deposited in the cylindrical hole to form a via.
An integrated circuit device (IC) device comprising:
An integrated circuit device (IC) device comprising:
An integrated circuit device (IC) device comprising:
Dependencies are inferred from the claim text.