Substrate treating apparatus and substrate treating method

A substrate treating apparatus comprising:

• a process chamber having an upper body and a lower body which are combined with each other to have a treatment space therein in which bake treatment is performed on a substrate;
• a support unit located inside the treatment space and supporting the substrate;
• a heating unit configured to heat the substrate placed on the support unit;
• a driver configured to move any one of the upper body and the lower body to move the upper body and the lower body between a process location and an open location;
• an interval state detection unit configured to detect an interval state between a side wall of the upper body and a side wall of the lower body when the upper body and the lower body are placed on the process location;
• and
• a controller configured to control the driver and the interval state detection unit,
• wherein the interval state detection unit includes:
• a pressure provision line configured to provide a fluid in a vertical direction toward a surface on which the side wall of the upper body and the side wall of the lower body face each other;
• and
• a pressure measurement member configured to measure a change in a pressure of the pressure provision line,
• wherein the pressure provision line includes:
• a main line connected to a pressure supply source;
• and
• a branch line branched off from the main line and connecting the main line and a fluid hole formed in the side wall of the upper body,
• wherein the pressure measurement member measures a change in a pressure of the branch line,
• wherein the interval state detection unit further includes:
• an interval detection plate installed on a surface, facing the side wall of the lower body, of the side wall of the upper body,
• wherein the pressure provision line provides the fluid between the side wall of the upper body and the side wall of the lower body through a fluid hole formed in the interval detection plate,
• wherein a thickness of the interval detection plate is provided to be the same as an interval between the side wall of the upper body and the side wall of the lower body facing each other in the process location,
• wherein the controller controls the driver and the interval state detection unit so that, while the substrate is treated inside the treatment space, an interval between the upper body and the lower body is maintained in a preset interval, and so that an interval state is determined on the basis of the pressure measured by the pressure measurement member, and when it is determined that the interval state is defective, the upper body or the lower body is moved.