US 12,228,499 B2 · Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method

Abstract

Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.

Claims19

Dependent claims

A method of fabricating a semiconductor device, the method comprising:

preparing the semiconductor device to be measured;
acquiring a hologram image of the semiconductor device by a pupil ellipsometry measurement apparatus;
reconstructing reflectance information based on the hologram image;
measuring the semiconductor device based on the reflectance information;
determining whether the semiconductor device is normal based on a result of the measuring;
and
performing a subsequent process on the semiconductor device based on the semiconductor device being determined to be normal,
wherein the acquiring of the hologram image comprises:
producing interference light through self-interference of reflected light from the semiconductor device by a self-interference generator (SIG) included in the pupil ellipsometry measurement apparatus;
and
detecting the hologram image of the interference light on a pupil plane by a first detector included in the pupil ellipsometry measurement apparatus.

8 more elements

A method of fabricating a semiconductor device, the method comprising:

producing interference light through self-interference of reflected light from a semiconductor device to be measured by a self-interference generator (SIG) included in a pupil ellipsometry measurement apparatus;
detecting a hologram image of the interference light on a pupil plane by a first detector included in the pupil ellipsometry measurement apparatus;
detecting an image of the reflected light on an imaging plane by a second detector included in the pupil ellipsometry measurement apparatus;
reconstructing reflectance information based on the hologram image;
measuring the semiconductor device based on the reflectance information;
determining whether the semiconductor device is normal based on a result of the measuring;
and
performing a subsequent process on the semiconductor device based on the semiconductor device being determined to be normal.

5 more elements

A method of fabricating a semiconductor device, the method comprising:

preparing the semiconductor device to be measured;
acquiring a hologram image of the semiconductor device by a pupil ellipsometry measurement apparatus;
reconstructing reflectance information based on the hologram image;
measuring the semiconductor device based on the reflectance information;
determining whether the semiconductor device is normal based on a result of the measuring;
and
performing a subsequent process on the semiconductor device based on the semiconductor device being determined to be normal.

4 more elements

Dependencies are inferred from the claim text.

Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method

Life of this patent

Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method

Life of this patent

Abstract

Claims19