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US 12,227,613 B2Granted
Photo-patternable organic semiconductor (OSC) polymers and methods of formation and applications thereof
AssigneeCorning Incorporated
InventorsMingqian He, Xin Li, Yang Li, Hongxiang Wang
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Abstract
A method, includes: reacting at least one donor group with at least one protected acceptor group to form a plurality of protecting group-containing OSC polymers; removing the protecting group from the plurality of protecting group-containing OSC polymers to form H-bonding sites; and fusing the H-bonding sites of a first OSC polymer backbone with H-bonding sites of a second OSC polymer backbone to form π-π interactions between conjugated OSC polymers.
Claims19
A method, comprising:
- reacting at least one donor group with at least one protected acceptor group to form a plurality of protecting group-containing OSC polymers;
- removing the protecting group from the plurality of protecting group-containing OSC polymers to form H-bonding sites;
- and
- fusing the H-bonding sites of a first OSC polymer backbone with H-bonding sites of a second OSC polymer backbone to form π-π interactions between conjugated OSC polymers,
- wherein the at least one donor group is:
- wherein LG represents a lipophilic group.
3 more elements
Dependencies are inferred from the claim text.