# US 12,225,775 B2 · Array substrate and fabrication method thereof, display panel

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 12,225,775 B2
- Document ID: US12225775B2
- Status: Granted
- Kind: B2
- Application number: 17/531,984
- Filed: 2021-11-22
- Published: 2022-09-08
- Granted: 2025-02-11
- Earliest claimed: 2021-03-08
- Assignees: Boe Technology Group Co., Ltd.
- Applicants: Boe Technology Group Co., Ltd.
- Inventors: Qiuhua Meng; Ming Liu
- Web page: https://patentgrep.com/patent/US12225775B2

## CPC

- H10K 59/8792: {comprising light absorbing layers, e.g. black layers}
- H10K 59/122: Pixel-defining structures or layers, e.g. banks
- H10K 59/38: comprising colour filters or colour changing media [CCM]
- H10K 59/80518: {Reflective anodes, e.g. ITO combined with thick metallic layers}
- H10K 59/12: Active-matrix OLED [AMOLED] displays
- H10K 59/1201: {Manufacture or treatment}
- H10K 59/80524: {Transparent cathodes, e.g. comprising thin metal layers}
- H10K 2102/3026: {Top emission}
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

Provided are an array substrate, a fabrication method thereof, and a display panel. The array substrate includes a substrate; a reflective electrode layer on the substrate; a pixel defining layer on a side of the reflective electrode layer away from the substrate; an anti-reflection layer between the reflective electrode layer and the pixel defining layer, and configured to absorb light from outside, an orthographic projection of the anti-reflection layer on the substrate being within an overlapping portion between the orthographic projection of the reflective electrode layer on the substrate and the orthographic projection of the pixel defining layer on the substrate; and a black matrix on a side of the pixel defining layer away from the substrate, an orthographic projection of at least a portion of the anti-reflection layer on the substrate not overlapping with an orthographic projection of the black matrix on the substrate.

## Claims

### Claim 1

An array substrate, comprising:
a substrate;
a reflective electrode layer on the substrate;
a pixel defining layer on a side of the reflective electrode layer away from the substrate, wherein an orthographic projection of the reflective electrode layer on the substrate overlaps with an orthographic projection of the pixel defining layer on the substrate;
an anti-reflection layer between the reflective electrode layer and the pixel defining layer, and configured to absorb light from outside, wherein an orthographic projection of the anti-reflection layer on the substrate is within an overlapping portion between the orthographic projection of the reflective electrode layer on the substrate and the orthographic projection of the pixel defining layer on the substrate;
a black matrix on a side of the pixel defining layer away from the substrate, wherein an orthographic projection of at least a portion of the anti-reflection layer on the substrate does not overlap with an orthographic projection of the black matrix on the substrate; and
a first protective layer on the side of the reflective electrode layer away from the substrate, wherein the first protective layer and the anti-reflection layer are formed from a same black metal oxide layer, and a light transmittance of a portion of the black metal oxide layer serving as the first protective layer is greater than a light transmittance of a portion of the black metal oxide layer serving as the anti-reflection layer.

### Claim 2 (depends on 1)

The array substrate of claim 1, wherein the orthographic projection of the anti-reflection layer on the substrate adjoins the orthographic projection of the black matrix on the substrate.

### Claim 3 (depends on 1)

The array substrate of claim 1, wherein the orthographic projection of the anti-reflection layer on the substrate partially overlaps with the orthographic projection of the black matrix on the substrate.

### Claim 4 (depends on 1)

The array substrate of claim 1, wherein an orthographic projection of at least one edge of the anti-reflection layer on the substrate coincides with an orthographic projection of an edge of the pixel defining layer on the substrate.

### Claim 5 (depends on 1)

The array substrate of claim 1, wherein a material of the anti-reflection layer comprises a black metal oxide.

### Claim 6 (depends on 5)

The array substrate of claim 5, wherein the black metal oxide is tungsten oxide (WOx) or molybdenum oxide (MoOx).

### Claim 7 (depends on 5)

The array substrate of claim 5, wherein a material of the reflective electrode layer comprises any one of silver or aluminum.

### Claim 8 (depends on 1)

The array substrate of claim 1, further comprising a display structure and a color filter layer on a side of the display structure away from the substrate, wherein
the display structure comprises:
the reflective electrode layer;
a light emitting layer on a side of the reflective electrode layer and the pixel defining layer away from the substrate; and
a transparent electrode layer on a side of the light emitting layer away from the substrate, and
the color filter layer comprises:
the black matrix; and
a color filter in an area defined by the black matrix.

### Claim 9 (depends on 8)

The array substrate of claim 8, wherein the first protective layer is between the reflective electrode layer and the light emitting layer.

### Claim 10 (depends on 1)

The array substrate of claim 1, further comprising: a second protective layer between the reflective electrode layer and the substrate.

### Claim 11 (depends on 10)

The array substrate of claim 10, wherein the second protective layer is made of indium tin oxide.

### Claim 12 (depends on 1)

The array substrate of claim 1, further comprising: a third protective layer between the reflective electrode layer and the anti-reflection layer, wherein the orthographic projection of the reflective electrode layer on the substrate is within an orthographic projection of the third protective layer on the substrate.

### Claim 13 (depends on 1)

A display panel, comprising the array substrate of claim 1.

### Claim 14

A method for fabricating an array substrate, comprising:
forming a reflective electrode layer on a substrate;
forming an anti-reflection layer and a pixel defining layer on a side of the reflective electrode layer away from the substrate, wherein the anti-reflection layer is configured to absorb light from outside and is formed between the reflective electrode layer and the pixel defining layer; an orthographic projection of the reflective electrode layer on the substrate overlaps with an orthographic projection of the pixel defining layer on the substrate; an orthographic projection of the anti-reflection layer on the substrate is within an overlapping portion between the orthographic projection of the reflective electrode layer on the substrate and the orthographic projection of the pixel defining layer on the substrate; and
forming a black matrix on a side of the pixel defining layer away from the substrate, wherein an orthographic projection of at least a portion of the anti-reflection layer on the substrate does not overlap with an orthographic projection of the black matrix on the substrate,
wherein the method further comprises forming a first protective layer on the side of the reflective electrode layer away from the substrate, wherein the first protective layer and the anti-reflection layer are formed from a same black metal oxide layer, and a light transmittance of a portion of the black metal oxide layer serving as the first protective layer is greater than a light transmittance of a portion of the black metal oxide layer serving as the anti-reflection layer.

### Claim 15 (depends on 14)

The method of claim 14, wherein forming the anti-reflection layer and the pixel defining layer on the side of the reflective electrode layer away from the substrate comprises:
forming an anti-reflection material layer on the side of the reflective electrode layer away from the substrate;
forming the pixel defining layer on a side of the anti-reflection material layer away from the substrate; and
processing the anti-reflection material layer by using the pixel defining layer as a mask to form the anti-reflection layer.

### Claim 16 (depends on 15)

The method of claim 15, wherein processing the anti-reflection material layer by using the pixel defining layer as the mask to form the anti-reflection layer comprises:
etching the anti-reflection material layer by using the pixel defining layer as the mask to remove a portion of the anti-reflection material layer exposed by the pixel defining layer.

### Claim 17 (depends on 15)

The method of claim 15, wherein processing the anti-reflection material layer by using the pixel defining layer as the mask to form the anti-reflection layer comprises:
modifying the anti-reflection material layer by using the pixel defining layer as the mask to make a portion of the anti-reflection material layer exposed by the pixel defining layer become light-transmissive.

### Claim 18 (depends on 14)

The method of claim 14, wherein a material of the anti-reflection layer comprises a black metal oxide.

### Claim 19 (depends on 14)

The method of claim 14, further comprising:
forming a light emitting layer on a side of the reflective electrode layer and the pixel defining layer away from the substrate; and
forming a transparent electrode layer on a side of the light emitting layer away from the substrate, wherein a light transmittance of the transparent electrode layer ranges from 40% to 60%.