# US 12,224,200 B2 · Substrate treating apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,224,200 B2 - Document ID: US12224200B2 - Status: Granted - Kind: B2 - Application number: 17/394,868 - Filed: 2021-08-05 - Published: 2022-03-03 - Granted: 2025-02-11 - Earliest claimed: 2020-08-25 - Assignees: Semes Co., Ltd. - Applicants: Semes Co., Ltd. - Inventors: Ji Hoon Jeong; Won-Geun Kim; Young Dae Chung; Jee Young Lee; Tae Shin Kim - Web page: https://patentgrep.com/patent/US12224200B2 ## CPC - H10P 72/0414: {using mainly spraying means, e.g. nozzles} - H10P 72/7618: {characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel} - H10P 72/0411: {for wet cleaning or washing} - H10P 72/0431: {Apparatus for thermal treatment} - H10P 72/0436: {mainly by radiation} - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract The present disclosure provides a substrate treating apparatus. The substrate treating apparatus includes a support unit that supports a substrate, and a heating unit that irradiates a beam to the substrate and heat the substrate, and the heating unit further includes an irradiation part that irradiates the beam, and a rotation part that rotates the beam. ## Claims ### Claim 1 A substrate treating apparatus comprising: a support unit configured to support a substrate; and a heating unit configured to irradiate a beam to the substrate and heat the substrate, wherein the heating unit further includes: an irradiation part configured to irradiate the beam; and a rotation part configured to rotate the beam and including a pair of cylindrical lenses located on a travel path of the beam irradiated by the irradiation part; wherein the pair of cylindrical lenses are configured to be rotatable and rotational directions of the pair of cylindrical lenses are the same; wherein the support unit and the heating unit are arranged on the same side with respect to the substrate. ### Claim 2 (depends on 1) The substrate treating apparatus of claim 1, wherein each of the cylindrical lenses has a shape, one surface of which is a planar surface that is flat, and an opposite surface of which is a curved surface. ### Claim 3 (depends on 2) The substrate treating apparatus of claim 2, wherein the planar surface of any one of the pair of cylindrical lenses and the planar surface of the other of the pair of cylindrical lenses face each other. ### Claim 4 (depends on 1) The substrate treating apparatus of claim 1, wherein the heating unit further includes: a reflection part configured to reflect the beam that passed through the rotation part in a direction that faces the substrate. ### Claim 5 (depends on 4) The substrate treating apparatus of claim 4, wherein the reflection part includes: a reflective mirror, of which a surface, to which the beam is input, has a flat or deflected shape. ### Claim 6 (depends on 5) The substrate treating apparatus of claim 5, wherein the heating unit further includes: a dispersion part configured to disperse the beam reflected by the reflection part. ### Claim 7 (depends on 6) The substrate treating apparatus of claim 6, wherein the dispersion part includes:' a lens barrel; and one or more dispersion lenses housed in the lens barrel. ### Claim 8 (depends on 7) The substrate treating apparatus of claim 7, wherein a plurality of dispersion lenses are provided, and a relative distance of the plurality of dispersion lenses is variable. ### Claim 9 (depends on 8) The substrate treating apparatus of claim 8, wherein the support unit further includes: a transmission plate formed of a transparent material; and a chuck pin configured to chuck the substrate while an upper surface of the transmission plate and a lower surface of the substrate are spaced apart from each other, and wherein the beam irradiated by the irradiation part is irradiated to the lower surface of the substrate. ### Claim 10 (depends on 9) The substrate treating apparatus of claim 9, wherein the support unit further includes: a support member configured to support an edge of the transmission plate; and a rotation member configured to rotate the support member. ### Claim 11 A substrate treating apparatus comprising: a support unit configured to support a substrate and optionally rotate the substrate; a liquid supply unit configured to supply a treatment liquid to the substrate; and a heating unit configured to irradiate a beam to the substrate and heat the substrate, and wherein the heating unit includes: an irradiation part configured to irradiate the beam; and a rotation part configured to rotate the beam and including a pair of cylindrical lenses located on a travel path of the beam irradiated by the irradiation part; wherein the pair of cylindrical lenses are configured to be rotatable and rotational directions of the pair of cylindrical lenses are the same; wherein the support unit and the heating unit are arranged on the same side with respect to the substrate. ### Claim 12 (depends on 11) The substrate treating apparatus of claim 11, wherein the support unit further includes: a transmission plate formed of a transparent material; and a chuck pin configured to chuck the substrate while an upper surface of the transmission plate and a lower surface of the substrate are spaced apart from each other, and wherein the beam irradiated by the irradiation part is irradiated to the lower surface of the substrate. ### Claim 13 (depends on 12) The substrate treating apparatus of claim 12, wherein the support unit further includes: a support member configured to support an edge of the transmission plate; and a rotation member configured to rotate the support member. ### Claim 14 (depends on 11) The substrate treating apparatus of claim 11, wherein each of the cylindrical lenses has a shape, one surface of which is a planar surface that is flat, and an opposite surface of which is a curved surface. ### Claim 15 A substrate treating apparatus comprising: a support member configured to support a substrate and formed of a transparent material; and a heating unit configured to heat the substrate by irradiating a laser beam to a lower surface of the substrate supported by the support member, wherein the heating unit includes: an irradiation part configured to irradiate the laser beam; and a rotation part configured to rotate the laser beam, and wherein the rotation part includes: a cylindrical lens located on a travel path of the laser beam irradiated by the irradiation part and configured to be rotatable. ### Claim 16 (depends on 15) The substrate treating apparatus of claim 15, wherein rotational directions of the cylindrical lenses are the same, and wherein each of the cylindrical lenses has a shape, one surface of which is a planar surface that is flat, and an opposite surface of which is a curved surface.