# US 12,224,198 B2 · Electrostatic chuck with mesas

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- Number: US 12,224,198 B2
- Document ID: US12224198B2
- Status: Granted
- Kind: B2
- Application number: 18/584,937
- Filed: 2024-02-22
- Published: 2024-07-18
- Granted: 2025-02-11
- Earliest claimed: 2021-04-15
- Assignees: Applied Materials, Inc.
- Applicants: Applied Materials, Inc.
- Inventors: Vijay D. Parkhe; Ashutosh Agarwal
- Web page: https://patentgrep.com/patent/US12224198B2

## CPC

- H10P 72/722: {Details of electrostatic chucks}
- H01J 37/32715: {Workpiece holder}
- H10P 72/7616: {characterised by a coating, a hardness or a material}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

Electrostatic chucks (ESCs) for plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic top plate having a top surface with a processing region. One or more electrodes is within the ceramic top plate. A plurality of mesas is within the processing region and on the top surface of the ceramic plate or vertically over an edge of one of the one or more electrodes.

## Claims

### Claim 1

A substrate support assembly, comprising:
a ceramic top plate having a top surface with a processing region;
one or more electrodes within the ceramic top plate; and
a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes.

### Claim 2 (depends on 1)

The substrate support assembly of claim 1, wherein the plurality of mesas is continuous with the top surface of the ceramic top plate.

### Claim 3 (depends on 1)

The substrate support assembly of claim 1, wherein the ceramic top plate comprises aluminum nitride.

### Claim 4 (depends on 1)

The substrate support assembly of claim 1, wherein the ceramic top plate comprises aluminum oxide.

### Claim 5 (depends on 1)

The substrate support assembly of claim 1, wherein the one or more electrodes comprise molybdenum.

### Claim 6

A substrate support assembly, comprising:
a ceramic top plate having a top surface with a processing region;
a molybdenum mesh within the ceramic top plate; and
a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over the molybdenum mesh.

### Claim 7 (depends on 6)

The substrate support assembly of claim 6, wherein the ceramic top plate comprises aluminum nitride.

### Claim 8 (depends on 6)

The substrate support assembly of claim 6, wherein the ceramic top plate comprises aluminum oxide.

### Claim 9

A substrate support assembly, comprising:
a ceramic top plate having a top surface with a processing region, the top surface having one or more high topography regions and one or more electrodes within the ceramic top plate; and
a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes.

### Claim 10 (depends on 9)

The substrate support assembly of claim 9, wherein the plurality of mesas is continuous with the top surface of the ceramic top plate.

### Claim 11 (depends on 9)

The substrate support assembly of claim 9, wherein the ceramic top plate comprises aluminum nitride.

### Claim 12 (depends on 9)

The substrate support assembly of claim 9, wherein the ceramic top plate comprises aluminum oxide.

### Claim 13 (depends on 9)

The substrate support assembly of claim 9, further comprising one or more electrodes comprising molybdenum.

### Claim 14

A substrate support assembly, comprising:
a ceramic top plate having a top surface with a processing region, the top surface having one or more stress regions;
one or more electrodes within the ceramic top plate; and
a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes.

### Claim 15 (depends on 14)

The substrate support assembly of claim 14, wherein the plurality of mesas is continuous with the top surface of the ceramic top plate.

### Claim 16 (depends on 14)

The substrate support assembly of claim 14, wherein the ceramic top plate comprises aluminum nitride.

### Claim 17 (depends on 14)

The substrate support assembly of claim 14, wherein the ceramic top plate comprises aluminum oxide.

### Claim 18 (depends on 14)

The substrate support assembly of claim 14, further comprising one or more electrodes comprising molybdenum.