Open microfocus x-ray source and control method thereof

An open microfocus X-ray source, comprising:

• an open X-ray tube, wherein the open X-ray tube comprises a cathode system, a deflection system and a focusing system, the cathode system is configured to emit an electron beam, the deflection system is configured to provide a deflection magnetic field for the electron beam, and the focusing system is configured to focus the electron beam to bombard an anode target to emit an X-ray;
• a high voltage power supply (HVPS) system, wherein the HVPS system is configured to provide an emission current I0, an accelerating high voltage U0 and a grid voltage UG for the electron beam;
• a vacuum system, wherein the vacuum system is configured to perform vacuumization;
• and
• a control system, wherein the control system is configured to control, according to a spot size of the electron beam for bombarding the anode target, the HVPS system to adjust the emission current I0, the accelerating high voltage U0, a deflection coil current IXY of the deflection system, and a focusing coil current IF of the focusing system, wherein the spot size meets a preset requirement,
• wherein the control system is further configured to:
• acquire initial parameters of the emission current I0, the accelerating high voltage U0, the deflection coil current IXY and the focusing coil current IF;
• control the open microfocus X-ray source to work at the initial parameters;
• and
• adjust the accelerating high voltage U0, the deflection coil current IXY and the focusing coil current IF with a machine learning algorithm to obtain deflection coil currents IXY and focusing coil currents IF corresponding to different accelerating high voltages Ue when the spot size of the electron beam meets the preset requirement, and store the deflection coil currents IXY and the focusing coil currents IF in a table.

A control method of an open microfocus X-ray source comprising an open X-ray tube, wherein the open X-ray tube comprises a cathode system, a deflection system and a focusing system, the cathode system is configured to emit an electron beam, the deflection system is configured to provide a deflection magnetic field for the electron beam, and the focusing system is configured to focus the electron beam to bombard an anode target to emit an X-ray:

• a high voltage power supply (HVPS) system, wherein the HVPS system is configured to provide an emission current I0, an accelerating high voltage U0 and a grid voltage UG for the electron beam:
• a vacuum system, wherein the vacuum system is configured to perform vacuumization;
• and a control system, wherein the control system is configured to control, according to a spot size of the electron beam for bombarding the anode target, the HVPS system to adjust the emission current I0, the accelerating high voltage U0, a deflection coil current IXY of the deflection system, and a focusing coil current IF of the focusing system, wherein the spot size meets a preset requirement, the method comprising:
• controlling the vacuum system to perform vacuumization;
• controlling the HVPS system to provide the emission current I0, the accelerating high voltage U0 and the grid voltage UG for the electron beam, wherein the cathode system emits the electron beam, the deflection system provides the deflection magnetic field for the electron beam, and the focusing system focuses the electron beam to bombard the anode target to emit the X-ray;
• and
• controlling, according to the spot size of the electron beam for bombarding the anode target, the HVPS system to adjust the emission current I0, the accelerating high voltage U0, the deflection coil current IXY of the deflection system, and the focusing coil current IF of the focusing system, wherein the spot size meets the preset requirement,
• wherein the control system is further configured to:
• acquire initial parameters of the emission current I0, the accelerating high voltage U0, the deflection coil current IXY and the focusing coil current IF;
• control the open microfocus X-ray source to work at the initial parameters;
• and
• adjust the accelerating high voltage U0, the deflection coil current IXY and the focusing coil current IF with a machine learning algorithm to obtain deflection coil currents IXY and focusing coil currents IF corresponding to different accelerating high voltages U0 when the spot size of the electron beam meets the preset requirement, and store the deflection coil currents IXY and the focusing coil currents IF in a table.