# US 12,222,309 B2 · Electrode substrate, method for manufacturing same, and biosensor using electrode substrate

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- Number: US 12,222,309 B2
- Document ID: US12222309B2
- Status: Granted
- Kind: B2
- Application number: 17/641,528
- Filed: 2020-08-28
- Published: 2022-10-20
- Granted: 2025-02-11
- Earliest claimed: 2019-09-18
- Assignees: Phc Holdings Corporation
- Applicants: PHC Holdings Corporation
- Inventors: Akihito Shirai; Takeshi Hatakeyama; Kazuya Kakutani
- Web page: https://patentgrep.com/patent/US12222309B2

## CPC

- A61B 5/1473: invasive, e.g. introduced into the body by a catheter
- G01N 27/3272: {Test elements therefor, i.e. disposable laminated substrates with electrodes, reagent and channels (optical biosensors G01N33/52)}
- A61B 5/685: {Microneedles}
- A61B 5/14532: {for measuring glucose, e.g. by tissue impedance measurement}
- A61B 5/14865: {invasive, e.g. introduced into the body by a catheter or needle or using implanted sensors}
- A61B 2562/125: characterised by the manufacture of electrodes
- A61B: DIAGNOSIS; SURGERY; IDENTIFICATION (usefulness limited to only animals A61D)
- G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q)

## Abstract

The present disclosure provides an electrode substrate including an insulating substrate having, on a surface thereof, a region where at least one fine uneven structure is formed and a plurality of smooth regions separated by the fine uneven structure; and a conductive thin film formed on the entire of at least one surface of the insulating substrate where the fine uneven structure is formed. According to the present disclosure, the conductive region and the insulating region can be simultaneously formed on the insulating substrate only by forming the conductive thin film in a single step on the entire surface of the single insulating substrate on which the fine uneven structure is formed.

## Claims

### Claim 1

An electrode substrate comprising:
an insulating substrate having, on a surface thereof, a region where a fine uneven structure is formed and a plurality of smooth regions separated by the fine uneven structure; and
a conductive thin film formed on an entirety of at least one surface of the insulating substrate where the fine uneven structure is formed,
wherein the conductive thin film formed on the region where the fine uneven structure is formed is discontinuous,
wherein the fine uneven structure region includes a plurality of protrusions discontinuous in at least one direction in a surface direction of the insulating substrate,
wherein the plurality of protrusions discontinuous in the at least one direction include columnar bodies, and for each columnar body, an intersection angle X′ between a side of the columnar body in a longitudinal cross-sectional shape and a line on a surface of a bottom of the fine uneven structure is 85° to 90°,
wherein each columnar body has a diagonal dimension of 10 to 50 nm and a height of 100 to 2000 nm, and the columnar bodies are disposed at intervals of 50 to 200 nm,
wherein each columnar body includes a substantial cone or a substantial pyramid coupled to an upper surface of the columnar body, the substantial cone or the substantial pyramid having a bottom surface which has the same shape as the upper surface of the columnar body or which has an area smaller than that of the upper surface of the columnar body.

### Claim 2 (depends on 1)

The electrode substrate according to claim 1, wherein each columnar body is a substantially circular column or a substantially prismatic column, and an inward inclination angle of a generatrix of the substantial cone or a side surface of the substantial pyramid is larger than an inclination angle of a generatrix of the substantially circular column or a side surface of the substantially prismatic column to which the substantial cone or the substantial pyramid is coupled.

### Claim 3 (depends on 1)

The electrode substrate according to claim 1, wherein the plurality of protrusions discontinuous in the at least one direction include wall bodies, and for each wall body, an intersection angle X′ between a side of the wall body in a longitudinal cross-sectional shape and a line on a surface of a bottom of the fine uneven structure is 85° to 90°.

### Claim 4 (depends on 3)

The electrode substrate according to claim 3, wherein each wall body has a bottom width of 10 to 50 nm, a length of 0.1 to 50000 μm, and a height of 100 to 2000 nm, and the wall bodies are arranged at intervals of 50 to 200 nm.

### Claim 5 (depends on 1)

The electrode substrate according to claim 1, wherein a thickness of the conductive thin film formed in a region where the fine uneven structure is formed is 5 to 100 nm.