Hard-mask forming composition, method for manufacturing electronic component, and compound and resin
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorKeiichi Ibata
Life of this patent
Estimating the term…
Abstract
A hard-mask forming composition that forms a hard mask that is used in lithography, the hard-mask forming composition including at least one of a compound represented by General Formula (sc-1) and a resin having a partial structure represented by General Formula (sc-p1). In the general formula, R11 and R12 are organic groups having 1 to 40 carbon atoms or hydrogen atoms; R13 and R14 are aromatic hydrocarbon groups having 6 to 30 carbon atoms which may have a substituent; R13 and R14 may be bonded to each other to form a structure having an aromatic heterocyclic ring, and the hydrogen atom of the phenylene group in the formula may be substituted with a substituent
Claims13
A hard-mask forming composition which forms a hard mask that is used in lithography, comprising:
- a resin (P) having a structural unit (u11) represented by General Formula (u11-1),
- wherein R11 and R12 are each independently an organic group having 1 to 40 carbon atoms or a hydrogen atom, R15a and R15b are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom R15a and R15b may be bonded to each other to form a structure having an aromatic heterocyclic ring, R16 and R17 are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom, R16 and R17 may be bonded to each other to form a structure having an aromatic ring, and a hydrogen atom of a phenylene group in the formula may be substituted with a substituent.
A hard-mask forming composition which forms a hard mask that is used in lithography, comprising:
- a resin (P) having a structural unit (u12) represented by General Formula (u12-1),
- wherein R11 is an organic group having 1 to 40 carbon atoms or a hydrogen atom, R18 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R19 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R20 and R21 are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms which may have a substituent, or a hydrogen atom, R22 and R23 may be bonded to each other to form a structure having an aromatic ring, and the hydrogen atoms of the two phenylene groups in the formula may be substituted with a substituent.
A hard-mask forming composition which forms a hard mask that is used in lithography, comprising:
- a resin (P) having a structural unit (u13) represented by General Formula (u13-1),
- wherein R11 is an organic group having 1 to 40 carbon atoms or a hydrogen atom, R24 is an organic group having 1 to 40 carbon atoms, R25 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R26 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R27 and R28 are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom, R27 and R28 may be bonded to each other to form a structure having an aromatic ring, and a hydrogen atom of a phenylene group in the formula may be substituted with a substituent.
A hard-mask forming composition which forms a hard mask that is used in lithography, comprising:
- a compound (SC) represented by General Formula (sc-1-1),
- wherein R11 is an aromatic hydrocarbon group, which may have a substituent, R12 is an organic group having 1 to 40 carbon atoms or a hydrogen atom, R29 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R30 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R31 and R32 are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom, R31 and R32 may be bonded to each other to form a structure having an aromatic ring, and the hydrogen atom of the two phenylene groups in the formula may be substituted with a substituent.
A compound represented by General Formula (sc-1-1),
- wherein R11 is an aromatic hydrocarbon group, which may have a substituent, R12 is an organic group having 1 to 40 carbon atoms or a hydrogen atom, R29 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R30 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R31 and R32 each independently are an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom, R31 and R32 may be bonded to each other to form a structure having an aromatic ring, and the hydrogen atom of the two phenylene groups in the formula may be substituted with a substituent.
A resin having a structural unit (u11) represented by General Formula (u11-1),
- wherein R11 bond and R12 are each independently an organic group having 1 to 40 carbon atoms or a hydrogen atom, R15a and R15b are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, R15a and R15b may be bonded to each other to form a structure having an aromatic heterocyclic ring, R16 and R17 are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom, R16 and R17 may be bonded to each other to form a structure having an aromatic ring, and a hydrogen atom of a phenylene group in the formula may be substituted with a substituent.
A compound represented by General Formula (sc-01-1),
- wherein R11a and R11b are each independently a group selected from the groups represented by Formulae (org-1) to (org-8), R29 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R30 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R31 and R32 are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom, R31 and R32 may be bonded to each other to form a structure having an aromatic ring, and the hydrogen atom of the two phenylene groups in the formula may be substituted with a substituent
A resin having a structural unit (u12) represented by General Formula (u12-1):
- wherein R11 is an organic group having 1 to 40 carbon atoms or a hydrogen atom, R18 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R19 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R20 and R21 are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom, R20 and R21 may be bonded to each other to form a structure having an aromatic ring, R22 and R23 are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom R22 and R23 may be bonded to each other to form a structure having an aromatic ring, and the hydrogen atoms of the two phenylene groups in the formula may be substituted with a substituent.
A resin having a structural unit (u13) represented by General Formula (u13-1):
- wherein R11 is an organic group having 1 to 40 carbon atoms or a hydrogen atom, R24 is an organic group having 1 to 40 carbon atoms, R25 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R26 is a group that forms an aromatic heterocyclic ring together with a nitrogen atom, R27 and R28 are each independently an aromatic hydrocarbon group having 6 to 30 carbon atoms, which may have a substituent, or a hydrogen atom, R27 and R28 may be bonded to each other to form a structure having an aromatic ring, and a hydrogen atom of a phenylene group in the formula may be substituted with a substituent.
Dependencies are inferred from the claim text.