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US 12,221,456 B2Granted
Metal complexes having triazenido ligands and uses thereof for depositing metals from the gas phase
AssigneeUmicore AG & Co. KG
InventorsJoerg Sundermeyer, Susanne Pulz, Fabian Schroeder
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Abstract
The invention relates to the use of a metal complex, which has at least one ligand of the formula R1—N3—R2, wherein R1 and R2 are hydrocarbon moieties, for depositing the metal or a compound of the metal from the gas phase. The invention further relates to methods for depositing metals from the metal complexes, and to metal complexes, substituted triazene compounds and to methods for the production thereof.
Claims10
Method for the production of coated substrates, comprising the steps of:
- a) providing a metal complex having at least one ligand L with the formula R1—N3—R2, wherein R1 and R2 are hydrocarbon radicals, for depositing the metal or a compound of the metal from the gas phase, and
- b) depositing the metal or a compound of the metal on the surface of the substrate by metal-organic vapor deposition,
- wherein the metal is selected from In, Co, Cu, Al, Ga, Tl and La, and
- wherein the metal complex decomposes in the gas phase at a temperature which is not more than 100° C. above the sublimation temperature or evaporation temperature, wherein the metal complex of formula (2):
- M[(L1)aXd] (2)
- wherein
- L1 has the formula R1—N3—R2, wherein R1 and R2 are alkyl radicals with 1 to 12 C atoms,
- X is selected from H, halogen, CO and alkyl having 1 to 6 C atoms,
- a=3,
- d=0 or 1.
7 more elements
Method for the production of coated substrates, comprising the steps of:
- a) providing a metal complex having at least one ligand L with the formula R1—N3—R2, wherein R1 and R2 are hydrocarbon radicals, for depositing the metal or a compound of the metal from the gas phase, and
- b) depositing the metal or a compound of the metal on the surface of the substrate by metal-organic vapor deposition,
- and
- wherein the metal complex decomposes in the gas phase at a temperature which is not more than 100° C. above the sublimation temperature or evaporation temperature,
- wherein the metal complex is of formula (4)
- M[(L1)3] (4)
- wherein
- L1 has the formula R1—N3—R2, wherein R1 and R2 are alkyl radicals with 1 to 12 C atoms, and
- M=In, Tl or La;
- or
- wherein the metal complex is of formula (5)
- Mx(L1)a (5)
- wherein
- L1 has the formula R1—N3—R2, wherein R1 and R2 are alkyl radicals with 1 to 12 C atoms,
- X is an integer between 1 and 4, and
- a is an integer between 3 and 8, with the proviso that a/x=1 or 2, and
- M=Co or Cu.
14 more elements
Dependencies are inferred from the claim text.