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US 12,221,352 B2Granted
Chlorosilane producing method
AssigneeTokuyama Corporation
InventorsKatsuya Ogihara, Shoji Iiyama, Kunihiko Matsumura
Life of this patent
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Abstract
Provided is a method for stably conducting a process for producing chlorosilanes by a chlorination reaction of metallic silicon. When producing chlorosilanes by the chlorination reaction of the metallic silicon, metallic silicon having a sodium content of 1 ppm or more and 90 ppm or less in terms of element and an aluminum content of 1000 ppm or more and 4000 ppm or less in terms of element is used as the metallic silicon. An average particle diameter of the metallic silicon is preferably about 150 μm to 400 μm.
Claims5
A method for producing chlorosilanes, comprising:
- reacting a) a chlorine source gas and b) metallic silicon having a sodium content of 1 ppm or more and 90 ppm or less in terms of element, and an aluminum content of 1600 ppm or more and 2100 ppm or less in terms of element;
- and
- producing a chlorosilane.
Dependencies are inferred from the claim text.