US 12,221,351 B2Granted

Silicene quantum dots-containing siloxene and preparation method therefor

AssigneeZhejiang University

InventorsJingyun Huang, Xinling Xu, Liping Zhou, Zhizhen Ye

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Abstract

Provided are a silicene quantum dots-containing siloxene thin film and a preparation method therefor, which belong to the field of fluorescent functional nanomaterials. A siloxene thin film embedded with silicene quantum dots is prepared by uniformly mixing CaSi2 with a decalcification organic solvent and a transition metal chloride catalyst in a proportion, performing acid washing, and then performing ultrasonic dispersion. The thickness of such siloxene thin film is less than 1 to 2.5 nm, the size of the silicene quantum dots is 2 to 5 nm. In addition, the siloxene thin film has strong fluorescence emission performance in a blue light region, has a pseudodirect band gap, and shows a good application prospect in the fields of photoelectricity and the like.

Claims18

Dependent claims

A method for preparing a silicene quantum dots-containing siloxene, comprising the following steps:

(1) uniformly mixing CaSi2, a decalcification organic solvent and a transition metal chloride catalyst, to obtain a mixed solution after fully reacting and decalcifying;
(2) transferring the mixed solution obtained in the step (1) to a centrifuge tube, removing the supernatant after high-speed centrifugation, and then adding excess hydrochloric acid to remove metal compound impurities, to obtain a mixed liquor;
and
(3) repeatedly washing the mixed liquor obtained in the step (2) for several times by high-speed centrifugation with absolute ethanol, then adding absolute ethanol for ultrasonic dispersion, then collecting the supernatant after low-speed centrifugation, and vacuum drying the supernatant to obtain a silicene quantum dots-containing siloxene nanofilm.

1 more element

Dependencies are inferred from the claim text.