# US 12,218,269 B2 · Substrate processing apparatus including light receiving device and calibration method of light receiving device

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- Number: US 12,218,269 B2
- Document ID: US12218269B2
- Status: Granted
- Kind: B2
- Application number: 17/172,082
- Filed: 2021-02-10
- Published: 2021-08-19
- Granted: 2025-02-04
- Earliest claimed: 2020-02-13
- Assignees: ASM IP Holding B.V.
- Applicants: ASM IP Holding B.V.
- Inventors: Kazuhiro Nishiwaki
- Web page: https://patentgrep.com/patent/US12218269B2

## CPC

- H10F 71/137: {Batch treatment of the devices}
- C23C 16/4586: {Elements in the interior of the support, e.g. electrodes, heating or cooling devices}
- C23C 16/52: Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)}
- G01J 1/42: using electric radiation detectors (optical or mechanical part G01J1/04; by comparison with a reference light or electric value G01J1/10)
- G01N 21/274: {Calibration, base line adjustment, drift correction}
- H01J 37/32715: {Workpiece holder}
- H01J 37/32972: {Spectral analysis}
- H10F 71/139: {using temporary substrates}
- G01J 2001/4247: {for testing lamps or other light sources}
- H10P 72/0604: {Process monitoring, e.g. flow or thickness monitoring}
- H10P 72/7621: {characterised by supporting two or more semiconductor substrates}
- H10F: INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- G01J: MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY (light sources F21, H01J, H01K, H05B; investigating properties of materials by optical means G01N)
- G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q)
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

Examples of a substrate processing apparatus includes a chamber configured to contain a stage, a light receiving device configured to receive light inside the chamber, and a substrate transfer apparatus that includes a shaft and a rotation arm configured to rotate with rotation of the shaft and is configured to supply a plurality of light beams having different amounts of light to the light receiving device.

## Claims

### Claim 1

A substrate processing apparatus comprising:
a chamber configured to contain a stage;
a light receiving device configured to receive light inside the chamber;
a substrate transfer apparatus that includes a shaft and a rotation arm configured to rotate with rotation of the shaft and is configured to supply a plurality of light beams having different amounts of light to the light receiving device; and
a light source, wherein a plurality of holes are provided on a side face of the shaft, the plurality of holes are configured to pass light of the light source.

### Claim 2 (depends on 1)

The substrate processing apparatus according to claim 1, wherein the substrate transfer apparatus is configured to divide light of the light source to supply the plurality of light beams.

### Claim 3 (depends on 2)

The substrate processing apparatus according to claim 2, wherein the light source is provided outside the chamber.

### Claim 4 (depends on 1)

The substrate processing apparatus according to claim 1, comprising a plurality of chambers comprising the chamber.

### Claim 5 (depends on 1)

The substrate processing apparatus according to claim 1, wherein the plurality of holes have different cross-sectional areas, respectively.

### Claim 6 (depends on 1)

The substrate processing apparatus according to claim 1, wherein the plurality of holes are provided with light transmitting materials which are different in light transmissivity from each other.

### Claim 7 (depends on 1)

The substrate processing apparatus according to claim 1, comprising a plurality of stages, wherein the substrate transfer apparatus is configured to move a substrate between the at least two of the plurality of stages.

### Claim 8

A substrate processing apparatus comprising:
a chamber configured to contain a stage;
a light receiving device configured to receive light inside the chamber;
a substrate transfer apparatus that includes a shaft and a rotation arm configured to rotate with rotation of the shaft and is configured to supply a plurality of light beams having different amounts of light to the light receiving device;
a light source; and
the rotation arm in plurality, wherein
the plurality of rotation arms are formed of a light transmitting material that transmits light,
a plurality of holes are provided on a side face of the shaft, the plurality of holes are configured to pass light of the light source, and
the plurality of rotation arms are provided in one-to-one correspondence with the plurality of holes.

### Claim 9 (depends on 8)

The substrate processing apparatus according to claim 8, the plurality of holes have different cross-sectional areas, respectively.

### Claim 10 (depends on 8)

The substrate processing apparatus according to claim 8, the plurality of holes are provided with light transmitting materials which are different in light transmissivity from each other.

### Claim 11 (depends on 8)

The substrate processing apparatus according to claim 8, the light source is provided outside the chamber.

### Claim 12 (depends on 8)

The substrate processing apparatus according to claim 8 comprising a plurality of stages, wherein the substrate transfer apparatus is configured to move a substrate between the at least two of the plurality of stages.
