# US 12,218,007 B2 · Self-aligned via formation using spacers

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- Number: US 12,218,007 B2
- Document ID: US12218007B2
- Status: Granted
- Kind: B2
- Application number: 17/340,629
- Filed: 2021-06-07
- Published: 2022-03-31
- Granted: 2025-02-04
- Earliest claimed: 2020-09-30
- Assignees: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicants: Taiwan Semiconductor Manufacturing Co., Ltd.
- Inventors: Yi-Nien Su; Jyu-Horng Shieh
- Web page: https://patentgrep.com/patent/US12218007B2

## CPC

- H10W 20/069: {by forming self-aligned vias or self-aligned contact plugs}
- H10W 20/087: {involving multiple stacked pre-patterned masks}
- H10P 50/73: {using masks for insulating materials}
- H10P 76/4085: {characterised by the processes involved to create the masks}
- H10W 20/0693: {by forming self-aligned vias}
- H10W 20/085: {involving intermediate temporary filling with material}
- H10W 20/089: {using processes for implementing desired shapes or dispositions of the openings, e.g. double patterning}
- H10W 20/056: {by filling conductive material into holes, grooves or trenches}
- H10W 20/062: {by smoothing of conductive parts, e.g. by planarisation}
- H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A method includes forming a first mandrel and a second mandrel over a dielectric layer, and forming a first spacer and a second spacer on the first mandrel and the second mandrel, respectively. The first spacer and the second spacer are next to each other with a space in between. The dielectric layer is etched to form an opening in the dielectric layer, with the opening being overlapped by the space, and with the first spacer and the second spacer being used as a part of an etching mask in the etching. A conductive material is filled into the opening. A planarization process is performed on the conductive material.

## Claims

### Claim 1

A method comprising:
forming a first mandrel and a second mandrel over a dielectric layer;
forming a first spacer and a second spacer on the first mandrel and the second mandrel, respectively, wherein the first spacer and the second spacer are next to each other with a first space in between;
forming a protection layer covering a part of the first mandrel and the first spacer;
forming a patterned etching mask over the protection layer, wherein the protection layer and the patterned etching mask are formed of different materials;
etching the dielectric layer to form an opening in the dielectric layer, wherein in the etching, the first mandrel, the second mandrel, the protection layer, the first spacer, the second spacer, and the patterned etching mask collectively define patterns of the dielectric layer, wherein the opening is overlapped by the first space;
filling a conductive material into the opening; and
performing a planarization process on the conductive material.

### Claim 2 (depends on 1)

The method of claim 1, wherein the opening penetrates through the dielectric layer, with a conductive feature underlying the dielectric layer being exposed to the opening, and wherein a remaining portion of the conductive material filling the opening forms a conductive via extending into the dielectric layer.

### Claim 3 (depends on 1)

The method of claim 1, wherein the opening stops at an intermediate level between a top surface and a bottom surface of the dielectric layer, and wherein a remaining portion of the conductive material forms a conductive line in an upper part of the dielectric layer.

### Claim 4 (depends on 1)

The method of claim 1, wherein the forming the first spacer and the second spacer comprises:
depositing a spacer layer on the first mandrel and the second mandrel; and
performing an anisotropic etching process on the spacer layer, with remaining portions of the spacer layer forming the first spacer and the second spacer.

### Claim 5 (depends on 1)

The method of claim 1 further comprising forming an additional etching mask on the first mandrel and the second mandrel and the first spacer and the second spacer, wherein the additional etching mask comprises an additional opening, with a part of the additional opening being directly over a part of the first spacer.

### Claim 6 (depends on 1)

The method of claim 1 further comprising forming a third spacer on the first mandrel, wherein the first spacer and the third spacer are on opposing sides of the first mandrel, and wherein the method further comprises:
removing the first mandrel to form a second space between the first spacer and the third spacer;
etching the dielectric layer to form an additional opening in the dielectric layer and directly underlying the second space, wherein the first spacer and the third spacer are used as a part of an additional etching mask; and
filling the additional opening with an additional conductive material.

### Claim 7 (depends on 1)

The method of claim 1, wherein the first spacer has a width, and a height greater than the width.

### Claim 8 (depends on 1)

The method of claim 1, wherein the planarization process is performed until the first spacer and the second spacer are removed.

### Claim 9 (depends on 1)

The method of claim 1 further comprising forming a hard mask over the dielectric layer, with the first mandrel and the second mandrel and the first spacer and the second spacer being formed over the hard mask.

### Claim 10 (depends on 1)

The method of claim 1, wherein at a time after the opening is formed, both of a top surface of the protection layer and a second top surface of the patterned etching mask are exposed.

### Claim 11

A method comprising:
forming a mandrel over a dielectric layer;
forming a first spacer on a sidewall of the mandrel, wherein the first spacer comprises a first sidewall and a second sidewall opposing to each other, wherein the second sidewall contacts the mandrel;
etching a first portion of the dielectric layer to form a first opening in the dielectric layer, wherein the first opening has a third sidewall vertically aligned to the first sidewall;
filling the first opening with a first conductive material;
forming a protection layer on the first conductive material;
forming an etching mask over the protection layer;
etching a second portion of the dielectric layer to form a second opening in the dielectric layer, wherein the protection layer and the etching mask collectively define parts of patterns of the dielectric layer, wherein the second opening has a fourth sidewall vertically aligned to the second sidewall; and
filling the second opening with a second conductive material.

### Claim 12 (depends on 11)

The method of claim 11 further comprising performing a planarization process to remove the first spacer, wherein a remaining portion of each of the first conductive material and the second conductive material forms a via or a metal line.

### Claim 13 (depends on 11)

The method of claim 11 further comprising forming a second spacer neighboring the first spacer, with a space locating between the first spacer and the second spacer, and wherein the first opening is directly underlying the space.

### Claim 14 (depends on 13)

The method of claim 13, wherein the first opening has a fifth sidewall opposing the third sidewall, and wherein the fifth sidewall is vertically aligned to a sixth sidewall of the second spacer.

### Claim 15 (depends on 11)

The method of claim 11 further comprising removing the mandrel, wherein the second portion of the dielectric layer is etched through a space left by the mandrel.

### Claim 16 (depends on 11)

The method of claim 11, wherein the forming the first spacer comprises:
depositing a spacer layer on the mandrel; and
performing an anisotropic etching process on the spacer layer, with a remaining portion of the spacer layer forming the first spacer.

### Claim 17

A method comprising:
forming a hard mask over a low-k dielectric layer;
forming a plurality of mandrels over the hard mask;
forming a plurality of spacers on sidewalls of the plurality of mandrels, wherein a first space, a second space, and a third space separate neighboring ones of the plurality of spacers, with some portions of the hard mask exposed to the first space, the second space, and the third space;
forming a protection layer filling into the first space;
patterning the protection layer to remove the protection layer from the second space and the third space;
forming a patterned etching mask over the protection layer;
in a first etching process, etching-through a first portion of the hard mask and a first portion of the low-k dielectric layer directly underlying the second space to form a first opening in the low-k dielectric layer, wherein the protection layer and the patterned etching mask are in combination used as etching masks; and
in a second etching process, etching-through a second portion of the hard mask and a second portion of the low-k dielectric layer directly underlying the third space to form a second opening in the low-k dielectric layer.

### Claim 18 (depends on 17)

The method of claim 17 further comprising filling a first conductive material into the first opening.

### Claim 19 (depends on 18)

The method of claim 18 further comprising filling a second conductive material into the second opening, wherein the first conductive material and the second conductive material are filled in separate filling processes.

### Claim 20 (depends on 18)

The method of claim 18 further comprising performing a planarization process to remove portions of the first conductive material over the low-k dielectric layer, wherein in the planarization process, the plurality of mandrels, the plurality of spacers, and the hard mask are removed.