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US 12,217,978 B2Granted
Etching device and etching method using the same
AssigneeSamsung Display Co., Ltd.
InventorsWonje Cho, Duckjung Lee
Life of this patent
Estimating the term…
Abstract
An etching device includes a nozzle unit including at least one nozzle including an etching solution injection hole, an etching solution collection hole, and a sealing part. The etching solution injection hole is configured to provide an etching solution to an etching object, the etching solution collection hole is configured to collect the etching solution, and the sealing part surrounds the etching solution injection hole and the etching solution collection hole to prevent the etching solution from leakage.
Claims11
An etching device comprising:
- a nozzle unit including at least one nozzle including an etching solution injection hole, an etching solution collection hole, and a seal,
- wherein the etching solution injection hole is configured to provide an etching solution to an etching object, the etching solution collection hole is configured to collect the etching solution, and
- wherein the seal surrounds the etching solution injection hole and the etching solution collection hole to prevent the etching solution from leakage, and
- wherein the etching solution collection hole is disposed in a level lower than a level where the etching solution injection hole is disposed, and
- wherein the etching solution collection hole and the etching solution injection hole are separate and not in fluid communication with each other within the nozzle unit.
2 more elements
Dependencies are inferred from the claim text.