Coating method and coating apparatus
AssigneeTokyo Electron Limited
InventorsYusaku Hashimoto, Masatoshi Kawakita, Kosuke Yoshihara
Life of this patent
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Abstract
A coating method of supplying a treatment solution to a substrate and coating the substrate with the treatment solution by a spin coating method. The method includes mixing a solvent for the treatment solution lower in surface tension than the treatment solution into the treatment solution concurrently with a start of supply of the treatment solution or later than the start of the supply of the treatment solution, and then supplying the treatment solution to the substrate.
Claims15
A coating method of supplying a treatment solution to a substrate and coating the substrate with the treatment solution by a spin coating method, the coating method comprising
- after a pre-wet treatment of the substrate, mixing a solvent for the treatment solution lower in surface tension than the treatment solution into the treatment solution concurrently with a start of supply of the treatment solution or later than the start of the supply of the treatment solution, and then supplying the treatment solution having the solvent mixed therein to the substrate having the pre-wet treatment;
- and
- ending the mixing of the solvent into the treatment solution before a stop of the supplying of the treatment solution to the substrate while continuing the supplying of the treatment solution without having the solvent mixed therein to the substrate, and continuing the supplying of the treatment solution without the solvent to the substrate after the end of the mixing to form a resist film on the substrate, wherein
- a mixing time of the solvent into the treatment solution is ½ to ⅔ of a supply time of the treatment solution.
A coating method of supplying a treatment solution to a substrate and coating the substrate with the treatment solution by a spin coating method, the coating method comprising
- after a pre-wet treatment of the substrate, mixing a solvent for the treatment solution lower in surface tension than the treatment solution into the treatment solution concurrently with a start of supply of the treatment solution or later than the start of the supply of the treatment solution, and then supplying the treatment solution having the solvent mixed therein to the substrate having the pre-wet treatment;
- and
- ending the mixing of the solvent into the treatment solution before a stop of the supplying of the treatment solution to the substrate while continuing the supplying of the treatment solution without having the solvent mixed therein to the substrate, and continuing the supplying of the treatment solution without the solvent to the substrate after the end of the mixing to form a resist film on the substrate, wherein
- a mixing time of the solvent into the treatment solution is ½ to ⅔ of a supply time of the treatment solution, and
- a mixing proportion of the solvent to the treatment solution is 3 to 50% of the treatment solution.
A coating method of supplying a treatment solution to a substrate and coating the substrate with the treatment solution by a spin coating method, the coating method comprising
- after a pre-wet treatment of the substrate, mixing a solvent for the treatment solution lower in surface tension than the treatment solution into the treatment solution concurrently with a start of supply of the treatment solution or later than the start of the supply of the treatment solution, and then supplying the treatment solution having the solvent mixed therein to the substrate having the pre-wet treatment;
- and
- ending the mixing of the solvent into the treatment solution before a stop of the supplying of the treatment solution to the substrate while continuing the supplying of the treatment solution without having the solvent mixed therein to the substrate, and continuing the supplying of the treatment solution without the solvent to the substrate after the end of the mixing to form a resist film on the substrate, wherein
- a mixing rate of the solvent to the treatment solution is changed over time to be lowered from an intermediate time point of a period of the mixing of the solvent into the treatment solution until the ending of the mixing.
Dependencies are inferred from the claim text.