# US 12,216,399 B2 · Method of manufacturing semiconductor device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,216,399 B2 - Document ID: US12216399B2 - Status: Granted - Kind: B2 - Application number: 18/582,045 - Filed: 2024-02-20 - Published: 2024-06-13 - Granted: 2025-02-04 - Earliest claimed: 2021-03-05 - Assignees: Taiwan Semiconductor Manufacturing Company, Ltd. - Applicants: Taiwan Semiconductor Manufacturing Company, Ltd. - Inventors: Chih-Tsung Shih; Tsung-Chih Chien; Tsung Chuan Lee; Hao-Shiang Chang - Web page: https://patentgrep.com/patent/US12216399B2 ## CPC - G03F 1/66: Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof - H10P 72/1902: {specially adapted for a single substrate} - H10P 72/1906: {specially adapted for containing masks, reticles or pellicles} - H10P 76/2041: {Photolithographic processes} - G03F 7/70741: {Handling masks outside exposure position, e.g. reticle libraries} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A reticle enclosure includes a base including a first surface, a cover including a second surface and coupled to the base with the first surface facing the second surface. The base and the cover form an internal space that includes a reticle. The reticle enclosure includes restraining mechanisms arranged in the internal space and for securing the reticle, and structures disposed adjacent the reticle in the internal space. The structures enclose the reticle at least partially, and limit passage of contaminants between the internal space and an external environment of the reticle enclosure. The structures include barriers disposed on the first and second surfaces. In other examples, a padding is installed in gaps between the barriers and the first and second surfaces. In other examples, the structures include wall structures disposed on the first and second surfaces and between the restraining mechanisms. ## Claims ### Claim 1 A method of manufacturing a semiconductor device, comprising: removing a reticle from a reticle pod, the reticle pod comprising: a base including a first surface, a cover including a second surface facing the first surface, the base and the cover forming an internal space housing the reticle, a plurality of restraining mechanisms arranged in the internal space and securing the reticle, and at least two barriers spaced from each other, concentrically arranged in the internal space, and at least partially surrounding the reticle, the at least two barriers being configured to limit passage of contaminants between the internal space and an external environment of the reticle pod; and exposing the reticle to radiation to reflect patterned radiation on a photoresist coated substrate. ### Claim 2 (depends on 1) The method of claim 1, further comprising inspecting a backside of the reticle before the exposing the reticle to radiation. ### Claim 3 (depends on 1) The method of claim 1, further comprising cleaning a backside of the reticle before the exposing the reticle to radiation. ### Claim 4 (depends on 1) The method of claim 1, further comprising securing the reticle to a reticle stage before the exposing the reticle to radiation. ### Claim 5 (depends on 1) The method of claim 1, further comprising storing the reticle in an environment under vacuum after the removing of the reticle from the reticle pod. ### Claim 6 (depends on 1) The method of claim 1, further comprising storing the reticle pod in an environment under vacuum. ### Claim 7 A method of manufacturing a semiconductor device, comprising: removing a reticle from a reticle pod, the reticle pod comprising: a base including a first surface, a cover including a second surface facing the first surface, the base and the cover forming an internal space housing the reticle; a plurality of restraining mechanisms arranged in the internal space and securing the reticle; and wall structures extending between the base and the cover and between the plurality of restraining mechanisms, the wall structures being concentrically arranged in the internal space and at least partially enclosing the reticle; and exposing the reticle to radiation to reflect patterned radiation on a photoresist coated substrate. ### Claim 8 (depends on 7) The method of claim 7, further comprising transferring the reticle to a reticle backside inspection stage and inspecting a backside of the reticle before the exposing the reticle to radiation. ### Claim 9 (depends on 8) The method of claim 8, further comprising cleaning the backside of the reticle within the reticle backside inspection stage. ### Claim 10 (depends on 9) The method of claim 9, further comprising removing the reticle from the reticle backside inspection stage and securing the reticle to a reticle stage before the exposing the reticle to radiation. ### Claim 11 (depends on 7) The method of claim 7, further comprising storing the reticle in a library held under vacuum before the exposing the reticle to radiation. ### Claim 12 A method of manufacturing a semiconductor device, comprising: removing a reticle from a reticle pod, the reticle pod comprising: a base, a cover coupled to the base and forming an internal space therebetween, the reticle positioned in the internal space, a plurality of restraining mechanisms arranged in the internal space and securing the reticle, and a plurality of barriers concentrically disposed in the internal space and surrounding the reticle, the plurality of barriers, the base, and the cover defining a tortuous path configured to limit passage of particles between the internal space and an external environment of the reticle pod; and exposing the reticle to radiation to reflect patterned radiation on a photoresist coated substrate. ### Claim 13 (depends on 12) The method of claim 12, further comprising removing the reticle pod from an outer pod before removing the reticle from the reticle pod. ### Claim 14 (depends on 13) The method of claim 13, further comprising a robot removing the reticle pod from the outer pod. ### Claim 15 (depends on 12) The method of claim 12, further comprising optically inspecting a backside of the reticle under vacuum. ### Claim 16 (depends on 15) The method of claim 15, further comprising measuring a size of a particle detected on the backside of the reticle. ### Claim 17 (depends on 16) The method of claim 16, further comprising cleaning the backside of the reticle. ### Claim 18 (depends on 12) The method of claim 12, further comprising storing the reticle under vacuum. ### Claim 19 (depends on 12) The method of claim 12, further comprising exchanging another reticle in a photolithography tool with the reticle. ### Claim 20 (depends on 19) The method of claim 19, further comprising securing the reticle to a reticle stage before the exposing the reticle to radiation.