# US 12,215,423 B2 · Gas manifold for simultaneous gas property control in deposition systems

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- Number: US 12,215,423 B2
- Document ID: US12215423B2
- Status: Granted
- Kind: B2
- Application number: 17/682,929
- Filed: 2022-02-28
- Published: 2023-08-31
- Granted: 2025-02-04
- Earliest claimed: 2022-02-28
- Assignees: Arradiance, Inc.
- Applicants: Arradiance, LLC
- Inventors: David R. Beaulieu; Jeffrey D. McHugh; Michael D. Trotter; Darith Kong
- Web page: https://patentgrep.com/patent/US12215423B2

## CPC

- C23C 16/4557: {Heated nozzles}
- C23C 16/4412: {Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps}
- C23C 16/452: by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species
- C23C 16/45517: {Confinement of gases to vicinity of substrate}
- C23C 16/45544: {characterized by the apparatus}
- C23C 16/45546: {specially adapted for a substrate stack in the ALD reactor}
- C23C 16/45565: {Shower nozzles}
- C23C 16/45574: {Nozzles for more than one gas}
- C23C 16/45591: {Fixed means, e.g. wings, baffles}
- C23C 16/54: Apparatus specially adapted for continuous coating
- H01J 37/32449: {Gas control, e.g. control of the gas flow}
- H10P 72/0402: {Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence)}
- H10P 72/0434: {mainly by convection}
- H01J 37/32458: {Vessel}
- H01J 37/32568: {Relative arrangement or disposition of electrodes; moving means}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A gas manifold includes a gas inlet surface having a first and second gas input port and a gas outlet surface. A first internal chamber is coupled to the first gas input port. A first plurality of gas conduits, each including an input coupled to the first internal chamber and an outlet at the gas outlet surface where a direction of at least one of the conduits in the first plurality of gas conduits relative to the gas outlet surface is different. A second internal chamber is coupled to the second gas input port and is isolated from the first internal chamber. A second plurality of gas conduits, each including an input coupled to the second internal chamber and an outlet at the gas outlet surface. A direction of at least one of the conduits in the second plurality of gas conduits relative to the gas outlet surface is different. Directions of at least some of the gas conduits in the first and second plurality of gas conduits relative to the gas outlet surface can be selected to provide a desired gas flow pattern proximate to the gas outlet surface.

## Claims

### Claim 1

A gas manifold comprising:
a) a gas inlet surface comprising a first gas input port and a second gas input port;
b) a gas outlet surface;
c) a first internal chamber coupled to the first gas input port;
d) a first plurality of gas conduits, each of the first plurality of gas conduits having an input coupled to the first internal chamber and an outlet at the gas outlet surface, wherein a direction of at least one of the first plurality of gas conduits relative to the gas outlet surface is different from a direction of another one of the first plurality of gas conduits relative to the gas outlet surface, wherein a cross-sectional area of the at least one of the conduits in the first plurality of gas conduits is different from a cross-sectional area of another one of the conduits in the first plurality of gas conduits, and wherein a cross-sectional shape of the at least one of the first plurality of gas conduits is different from a cross-sectional shape of another one of the first plurality of gas conduits;
e) a second internal chamber coupled to the second gas input port, wherein the second internal chamber is isolated from the first internal chamber; and
f) a second plurality of gas conduits, each of the second plurality of gas conduits having an input coupled to the second internal chamber and an outlet at the gas outlet surface, wherein a direction of at least one of the second plurality of gas conduits relative to the gas outlet surface is different from a direction of another one of the second plurality of gas conduits relative to the gas outlet surface.

### Claim 2 (depends on 1)

The gas manifold of claim 1, wherein a direction of each of the first plurality of gas conduits relative to the gas outlet surface is different from a direction of each of the other of the first plurality of gas conduits relative to the gas outlet surface.

### Claim 3 (depends on 2)

The gas manifold of claim 2, wherein a direction of each of the second plurality of gas conduits relative to the gas outlet surface is different from a direction of each of the other of the second plurality of gas conduits relative to the gas outlet surface.

### Claim 4 (depends on 1)

The gas manifold of claim 1, wherein a cross-sectional shape of the at least one of the second plurality of gas conduits is different from a cross-sectional shape of another one of the second plurality of gas conduits.

### Claim 5 (depends on 1)

The gas manifold of claim 1, wherein at least some of the first and second plurality of gas conduits are intersected in a way that provides a desired volumetric gas flow pattern proximate to the gas outlet surface.

### Claim 6 (depends on 1)

The gas manifold of claim 1, wherein at least one of the first and second plurality of gas conduits is formed with a non-uniform cross-sectional area along a longitudinal length.

### Claim 7 (depends on 1)

The gas manifold of claim 1, wherein at least one of the first and second plurality of conduits is configured to have a resultant volumetric gas flow pattern proximate to the gas outlet surface to be a uniform distribution of gas or a non-uniform distribution of gas.

### Claim 8 (depends on 1)

The gas manifold of claim 1, wherein the gas manifold is an atomic layer deposition gas manifold.

### Claim 9 (depends on 1)

The gas manifold of claim 1, wherein the gas manifold is a molecular layer deposition gas manifold.

### Claim 10 (depends on 1)

The gas manifold of claim 1, wherein the gas manifold is a chemical vapor deposition gas manifold.

### Claim 11 (depends on 1)

The gas manifold of claim 1, further comprising at least one temperature controller that controls a temperature of gas in at least one of the first and second plurality of gas conduits.

### Claim 12 (depends on 1)

The gas manifold of claim 1, wherein a cross-sectional area of at least two of the conduits in the first plurality of gas conduits is the same.
