# US 12,215,422 B2 · Shower head structure and plasma processing apparatus using the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,215,422 B2 - Document ID: US12215422B2 - Status: Granted - Kind: B2 - Application number: 18/516,991 - Filed: 2023-11-22 - Published: 2024-03-14 - Granted: 2025-02-04 - Earliest claimed: 2019-08-23 - Assignees: Taiwan Semiconductor Manufacturing Company, Ltd. - Applicants: Taiwan Semiconductor Manufacturing Company Ltd. - Inventors: Huan-Chieh Chen; Jhih-Ren Lin; Tai-Pin Liu; Shyue-Shin Tsai; Keith Kuang-Kuo Koai - Web page: https://patentgrep.com/patent/US12215422B2 ## CPC - C23C 16/45565: {Shower nozzles} - C23C 16/509: using internal electrodes - B05B 1/182: {characterised by their outlet openings or elements; Mounting arrangements therefor} - B05B 1/1823: {Concentric or coaxial groups} - B05B 1/185: {characterised by their outlet element; Mounting arrangements therefor} - C23C 16/46: characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence) - C23C 16/50: using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} - H01J 37/3244: {Gas supply means} - H01J 37/32449: {Gas control, e.g. control of the gas flow} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - B05B: SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES (spray-mixers with nozzles B01F25/72; processes for applying liquids or other fluent materials to surfaces by spraying B05D) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract A shower head structure and a plasma processing apparatus are provided. The shower head structure includes a plate body with a first zone and a second zone on a first surface. A plurality of first through holes are in the first zone, each of the first through holes having a diameter uniform with others of the first through holes. A plurality of second through holes are in the second zone. The first zone is in connection with the second zone, and the diameter of each of the first through holes is greater than a diameter of each of the second through holes. A plasma processing apparatus includes the shower head structure is also provided. ## Claims ### Claim 1 A shower head structure, comprising: a plate body having a first zone and a second zone; a plurality of first through holes in the first zone; and a plurality of second through holes in the second zone; wherein the first zone is in connection with the second zone, the first zone is at the central region of the plate body, the second zone is at the peripheral region of the plate body, and the diameter of each of the second through holes is less than 2 times of a thickness of a Debye sheath layer; wherein an amount of gas flow through the plurality of first through holes in the first zone per unit area is substantially equal to an amount of gas flow through the plurality of second through holes in the second zone per unit area; and wherein an area of the first through holes per unit area is equal to an area of the second through holes per unit area, and an amount of the first through holes per unit area is less than an amount of the second through holes per unit area. ### Claim 2 (depends on 1) The shower head structure of claim 1, wherein a ratio between a diameter of the first zone and a diameter of the plate body is in a range of from about 0.7:1 to about 0.8:1. ### Claim 3 (depends on 1) The shower head structure of claim 1, wherein each of the first through holes has a diameter uniform with others of the first through holes, and each of the second through holes has a diameter uniform with others of the second through holes. ### Claim 4 (depends on 1) The shower head structure of claim 1, wherein the diameter of each of the second through holes is less than 90% of the diameter of each of the first through holes. ### Claim 5 (depends on 1) The shower head structure of claim 1, wherein the second zone is a band region surrounding the first zone. ### Claim 6 (depends on 1) The shower head structure of claim 1, wherein the plurality of second through holes are arranged in at least a first band and a second band concentrically, and the second through holes in the second band is staggerly disposed with respect to the second through holes in the first band. ### Claim 7 A shower head structure, comprising: a plate body having a first surface and a second surface opposite to the first surface, the plate body comprising a first zone and a second zone, wherein gas flows through the plate body from the first surface toward the second surface during operation, the first zone is surrounded by the second zone, and an amount of gas flow through the plate body in the first zone per unit area is substantially equal to an amount of gas flow through the plate body in the second zone per unit area; a plurality of first holes open at the first surface and in the first zone; a plurality of second holes open at the first surface and in the second zone; a plurality of third holes open at the second surface, in the first zone, and each of the third holes being in connection with each of the first holes; and a plurality of fourth holes open at the second surface, in the second zone, and each of the fourth holes being in connection with each of the second holes; wherein a diameter of each of the second holes is less than 2 times of a thickness of a Debye sheath layer. ### Claim 8 (depends on 7) The shower head structure of claim 7, wherein the diameter of the third hole is substantially equal to or greater than the diameter of the first hole. ### Claim 9 (depends on 7) The shower head structure of claim 7, wherein the second zone is a band region from about 0.7 times of a radius of the shower head structure to an edge of the shower head structure. ### Claim 10 (depends on 7) The shower head structure of claim 7, wherein the plurality of second holes being arranged in at least a first band and a second band concentrically. ### Claim 11 (depends on 7) The shower head structure of claim 7, wherein a narrowest diameter of the third hole is greater than a narrowest diameter of the fourth hole. ### Claim 12 (depends on 7) The shower head structure of claim 7, wherein a length of the fourth hole is greater than a length of the second hole. ### Claim 13 (depends on 7) The shower head structure of claim 7, wherein the diameter of the second hole is less than 0.5 mm. ### Claim 14 (depends on 7) The shower head structure of claim 7, wherein respective diameters of the first holes are uniform, respective diameters of the second holes are uniform, respective diameters of the third holes are uniform, and respective diameters of the fourth holes are uniform. ### Claim 15 A plasma processing apparatus, comprising: a chamber; a radio frequency (RF) power source coupled to the chamber; a shower head in the chamber and coupled to the RF power source, wherein the shower head is configured to provide a uniform amount of gas flow per unit area across the entire shower head; and a susceptor below the shower head, and a first surface of the shower head facing the susceptor; wherein the first surface of the shower head having a plurality of first through holes in a first zone, and a plurality of second through holes in a second zone, the first zone is surrounded by the second zone, an amount of gas flow through the plate body in the first zone per unit area is substantially equal to an amount of gas flow through the plate body in the second zone per unit area during operation, and a second diameter of each of the second through holes is less than 2 times of a thickness of a Debye sheath layer. ### Claim 16 (depends on 15) The apparatus of claim 15, wherein the first zone is from a center to about 0.7 time of a radius of the shower head. ### Claim 17 (depends on 15) The apparatus of claim 15, wherein an amount of the first through holes per unit area is less than or equal to an amount of the second through holes per unit area. ### Claim 18 (depends on 15) The apparatus of claim 15, wherein an edge of the shower head is physically connected to the RF power source. ### Claim 19 (depends on 15) The apparatus of claim 15, further comprising: a blocker plate over the shower head in the chamber; and a heater below the susceptor. ### Claim 20 (depends on 15) The apparatus of claim 15, wherein the plurality of second through holes are arranged in at least a first band and a second band concentrically, and the second through holes in the second band is staggerly disposed with respect to the second through holes in the first band.