# US 12,214,563 B2 · Supply method, supply device, and cleaning agent > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,214,563 B2 - Document ID: US12214563B2 - Status: Granted - Kind: B2 - Application number: 18/002,051 - Filed: 2021-04-08 - Published: 2023-10-26 - Granted: 2025-02-04 - Earliest claimed: 2020-10-26 - Assignees: Raiser Moon, Inc. - Applicants: Keiyo Chemical Co., Ltd. - Inventors: Tatsuhiro Nemoto; Yutaka Kondoh; Yuka Kuriyama - Web page: https://patentgrep.com/patent/US12214563B2 ## CPC - B29C 64/35: Cleaning - B08B 1/14: Wipes; Absorbent members, e.g. swabs or sponges (with integrated means for dispensing fluids B08B1/40) - B08B 3/003: {Cleaning involving contact with foam} - B08B 3/10: with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration - B29C 71/0009: {using liquids, e.g. solvents, swelling agents (spectacle cases, e.g. for cleaning contact lenses A45C11/04; disinfecting or sterilising contact lenses A61L12/00, using liquid substances A61L2/20; cleaning involving the use of liquid in general B08B3/00; for hydrating contact lenses B29D11/00067)} - B29C 64/40: Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof - B29C 2071/0027: {Removing undesirable residual components, e.g. solvents, unreacted monomers} - B33Y 40/20: Post-treatment, e.g. curing, coating or polishing - B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00) - B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL - B33Y: ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING ## Abstract A sponge type cleaning device includes a sponge type cleaning tank, a sponge capable of retaining a cleaning agent (a liquid substance), a sample retaining structure retaining a model material (a sample), a movement mechanism capable of moving the sample retaining structure freely forward and backward with respect to the sponge, a cleaning agent supply mechanism supplying the cleaning agent to the sponge type cleaning tank, a rinsing liquid supply mechanism supplying a rinsing liquid to the sponge type cleaning tank, a waste liquid containing tank containing water discharged from the sponge type cleaning tank, a liquid level sensor provided in the sponge type cleaning tank, and a control mechanism controlling each of the mechanisms. ## Claims ### Claim 1 A supply device comprising: a gas-liquid supply mechanism configured to supply a liquid substance containing foam to one or more of openings formed on a surface of a sample, wherein the gas-liquid supply mechanism is configured to freely switch between a gas-liquid contact state in which the sample is in contact with the liquid substance and a gas-liquid contact retraction state in which the sample is retracted from contacting the liquid substance repeatedly, and a size of the one or more of openings ranges from 0.5 mm to 2 mm, wherein the gas-liquid supply mechanism includes: a sponge having elasticity; a tank containing the sponge; and a sponge deformation mechanism configured to deform the sponge, wherein the sponge has an open-cell structure, the sponge in the tank is partially exposed from a liquid level and contains the liquid substance, in the gas-liquid contact retraction state, the sponge deformation mechanism is capable of deforming the sponge such that an abutting portion of the sponge is recessed in a state in which the one or more of openings of the sample abut to the sponge, and releasing the deformation of the sponge such that the one or more of openings of the sample are retracted from the sponge, and the gas-liquid contact state is set in accordance with the deformation of the sponge, and the gas-liquid contact retraction state is set in accordance with the release of the deformation of the sponge. ### Claim 2 (depends on 1) The supply device according to claim 1, wherein a cut is formed in the sponge, and the cut is capable of containing the sponge. ### Claim 3 (depends on 1) The supply device according to claim 1, wherein the sponge is formed into a cylindrical body and is configured to surround the sample. ### Claim 4 (depends on 1) The supply device according to claim 1, wherein the sponge is in a shape of a sheet and is configured to surround the sample. ### Claim 5 (depends on 3) The supply device according to claim 3, wherein the sponge includes a sheet-shaped sponge main body, the sheet-shaped sponge main body includes: a first engagement portion; and a second engagement portion formed in a position separated from the first engagement portion, the first engagement portion can be engaged/disengaged with respect to the second engagement portion, and when the first engagement portion is engaged with the second engagement portion, the sheet-shaped sponge main body is capable of surrounding the sample. ### Claim 6 (depends on 1) The supply device according to claim 1, wherein the sponge deformation mechanism is configured to deform the tank entirely, or deform a part of the tank, and the sponge is disposed in the tank so as to deform together with deformation of a deformable portion of the tank. ### Claim 7 (depends on 1) The supply device according to claim 1, wherein the sponge deformation mechanism includes: a movement mechanism configured to freely move the sample forward and backward with respect to the sponge, in a manner that the sponge is freely switched between a press state in which the sponge is pressed by the sample, and a press retraction state in which the sample is retracted from the sponge, and the gas-liquid contact state is set in the press state, and the gas-liquid contact retraction state is set in the press retraction state. ### Claim 8 (depends on 1) The supply device according to claim 1, wherein the sample comprises a support material and a model material, the cleaning agent has fluidity in a range of a melting point that is higher than or equal to that of the support material and lower than a melting point of the model material, in which, the melting point of the support material is lower than that of the model material, the supply device further comprises a temperature adjustment mechanism capable of adjusting a temperature such that the cleaning agent has the fluidity, the temperature adjustment mechanism includes: an external tank configured to contain the tank, the liquid substance, and the sample; and a temperature adjustment unit configured to adjust a temperature of an internal space of the external tank, the movement mechanism includes: a shaft; a driving device configured to rotate the shaft; and a cam mechanism configured to convert a rotational motion of the shaft to a linear motion of the sample, wherein the driving device is disposed outside the external tank, and the shaft is communicated with a hole formed in the external tank. ### Claim 9 (depends on 1) The supply device according to claim 1, wherein the sample includes a model material formed by a 3D printer; and a support material attached to the model material. ### Claim 10 (depends on 9) The supply device according to claim 9, wherein the liquid substance is a cleaning agent for removing the support material from the model material. ### Claim 11 A supply device comprising: a gas-liquid supply mechanism configured to supply a liquid substance containing foam to one or more of openings formed on a surface of a sample, wherein the gas-liquid supply mechanism is configured to freely switch between a gas-liquid contact state in which the sample is in contact with the liquid substance and a gas-liquid contact retraction state in which the sample is retracted from contacting the liquid substance repeatedly; wherein the gas-liquid supply mechanism includes: a tank; a lid configured to freely close and open formed in the tank; a filter configured to partition a containing space of the tank into a first containing space and a second containing space; and a movement mechanism configured to move the tank to perform at least one of a reciprocation motion, a rotational motion, and an orbital motion; the filter is capable of allowing the liquid substance to pass through and controlling passing of the sample, the sample is disposed on one side of the containing space partitioned by the filter, the liquid substance reciprocates between the first containing space and the second containing space through the filter, in accordance with impartment of an external force, and the reciprocation of the liquid substance causes switching between the gas-liquid contact state and the gas-liquid contact retraction state; wherein the cleaning agent has fluidity in a range of a melting point that is higher than or equal to that of the support material and lower than a melting point of the model material, in which, the melting point of the support material is lower than that of the model material, the supply device further comprises a temperature adjustment mechanism capable of adjusting a temperature such that the cleaning agent has the fluidity, the temperature adjustment mechanism includes: an external tank capable of containing the tank, the liquid substance, and the sample; and a temperature adjustment unit capable of adjusting a temperature of an internal space of the external tank, the movement mechanism includes: a shaft; a driving device capable of rotating the shaft; and a power transmission mechanism capable of converting a rotational motion of the shaft into at least one of the reciprocation motion, the rotational motion, and the orbital motion of the tank, the driving device is disposed outside the external tank, and the shaft is communicated with a hole formed in the external tank.