# US 12,214,493 B2 · Optical manipulation apparatus

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- Number: US 12,214,493 B2
- Document ID: US12214493B2
- Status: Granted
- Kind: B2
- Application number: 17/415,561
- Filed: 2019-12-10
- Published: 2022-02-24
- Granted: 2025-02-04
- Earliest claimed: 2018-12-18
- Assignees: InterDigital CE Patent Holdings, SAS
- Applicants: InterDigital CE Patent Holdings, SAS
- Inventors: Oksana Shramkova; Laurent Blonde; Valter Drazic; Mitra Damghanian
- Web page: https://patentgrep.com/patent/US12214493B2

## CPC

- B25J 7/00: Micromanipulators {(specimen supports for investigating or analysing materials G01N23/2204; associated with microscopes G02B21/32; means for supporting or positioning the objects or the material in discharge tubes H01J37/20)}
- G02B 3/0043: {Inhomogeneous or irregular arrays, e.g. varying shape, size, height}
- G02B 21/32: Micromanipulators structurally combined with microscopes
- G02B 27/56: Optics using evanescent waves, i.e. inhomogeneous waves
- G02F 1/29: for the control of the position or the direction of light beams, i.e. deflection
- B25J: MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES ({manipulators specially adapted for use in surgery A61B34/70; manipulators used in cleaning hollow articles B08B9/04}; manipulators associated with rolling mills B21B39/20; manipulators associated with forging machines B21J13/10; {manipulators associated with picking-up and placing mechanisms B23P19/007}; means for holding wheels or parts thereof B60B30/00; {vehicles with ground-engaging propulsion means, e.g. walking members B62D57/02, B62D57/032; devices for picking-up and depositing articles or materials between conveyors B65G47/90, B65G47/91; manipulators with gripping or holding means for transferring packages B65H67/065}; cranes B66C; {manipulators used in the protection or supervision of pipe-line installations F17D5/00; walking equipment adapted for nuclear steam-generators F22B37/006}; manipulators specially adapted for, or associated with, nuclear reactors G21C; {apparatus used for handling wafers during manufacture or treatment of semiconductor H10P72/50})
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS

## Abstract

A device configured for radiating a focused electromagnetic beam is proposed. Such device comprises: —a first (101) and a second (102) part having respectively a second n2 and third n3 refractive index and a first W1 and second W2; —a first contact area (100e1) intended to be between a host medium having a first refractive index n1 and in which the micro or nanoparticles are intended to be trapped or moved by a focused electromagnetic beam radiated by the device; —a second contact area (100e2) between the first part and the second part; and —a third contact area (100e3) intended to be between the second part and the host medium. The focused electromagnetic beam results from a combination of at least two beams among a first (NJ1), a second (NJ2) and a third (NJ3) jet beams radiated respectively by the first, second and third contact areas when an incoming electromagnetic wave (IEM) illuminates the device. The device is configured for having a direction of propagation of the focused electromagnetic beam tilted in respect of a direction of propagation of the incoming electromagnetic wave.

## Claims

### Claim 1

A device configured to radiate a focused electromagnetic beam in a dielectric host medium having a first refractive index n1 when an incoming electromagnetic wave illuminates a first face of the device, wherein the device comprises:
a first material having a second refractive index n2 and having a first width W1 along a first direction of extension of the first face; and
a second material in contact with the first material and having a third refractive index n3, wherein the second material has a second width W2 along the first direction,
where n1<n3<n2, and where W1+W2 is greater than a wavelength λ in the host medium of the incoming electromagnetic wave, the first material and the second material extending along a second direction orthogonal to the first face from the first face up to a radiating face of each material, opposite to the first face, the first material and the second material having respectively a first height H1 and a second height H2 along the second direction, where |H2−H1|≤λ/4;
wherein the device comprises, when the device is in contact with the dielectric host medium and when the incoming electromagnetic wave illuminates the first face:
a first contact area between the dielectric host medium and the first material, the first contact area radiating a first jet beam in a near field zone;
a second contact area between the first material and the second material, the second contact area radiating a second jet beam in the near field zone; and
a third contact area between the second material and the dielectric host medium, the third contact area radiating a third jet beam in the near field zone,
wherein the focused electromagnetic beam results from a combination of at least two beams among the first jet beam, the second jet beam, and the third jet beam, wherein a direction of propagation of the focused electromagnetic beam is tilted with respect to a direction of propagation of the incoming electromagnetic wave.

### Claim 2 (depends on 1)

The device according to claim 1, wherein the direction of propagation of the focused electromagnetic beam is tilted with respect to a direction of propagation of the incoming electromagnetic wave as a function of at least part of:
the first refractive index n1, the second refractive index n2, and the third refractive index n3;
the first width W1 and the second width W2; and
the first height H1 and the second height H2.

### Claim 3 (depends on 1)

The device according to claim 1, wherein the focused electromagnetic beam results from a combination of the first jet beam, the second jet beam, and the third jet beam.

### Claim 4 (depends on 1)

The device according to claim 1,
wherein n3≥√{square root over (n1n2)},
wherein W1=W2, and
wherein H1≥HA, with HA a height, along the second direction and relative to the first face, of the intersection point of the first jet beam and the second jet beam.

### Claim 5 (depends on 1)

The device according to claim 1, wherein n3<√{square root over (n1n2)} and wherein W2>W1.

### Claim 6 (depends on 1)

The device according to claim 1,
wherein n3<√{square root over (n1n2)},
wherein W2<W1, and
wherein H1≥HA, with HA the height, along the Z-axis and relative to the first face, of an intersection point of the first jet beam and the second jet beam.

### Claim 7 (depends on 1)

The device according to claim 1,
wherein n3<√{square root over (n1n2)},
wherein W2<W1, and
wherein H1 is targeted to be equal to HA−λ/2, with HA the height, along the second direction and relative to the first face, of an intersection point of the first jet beam and the second jet beam.

### Claim 8 (depends on 4)

The device according to claim 4, wherein the height
H
A
=
W
1
tan
⁢
⁢
Θ
B
⁢
1
+
tan
⁢
⁢
Θ
B
⁢
2
,
where ΘB1 and ΘB2 are, respectively, radiation tilt angles of the first jet beam and the second jet beam with respect to the direction of propagation of the incoming electromagnetic wave.

### Claim 9 (depends on 8)

The device according to claim 8,
wherein ΘB1 is equal to
9
⁢
0
∘
-
Θ
TIR
⁢
⁢
1
+
α
1
2
and ΘB2 is equal to
9
⁢
0
∘
-
Θ
TIR
⁢
⁢
2
+
α
2
2
,
where angles α1 and α2 are respectively base angles of the first contact area and of the second contact area relative to the first direction, and
where ΘTIR1 and ΘTIR2 are limit angles of refraction associated with, respectively, the first contact area and the third contact area.

### Claim 10 (depends on 9)

The device according to claim 9, wherein
Θ
TIR
⁢
⁢
1
=
sin
-
1
⁡
(
n
1
n
2
)
⁢
⁢
and
Θ
TIR
⁢
⁢
2
=
sin
-
1
⁡
(
n
3
n
2
)
.

### Claim 11 (depends on 1)

The device according to claim 1, wherein the wavelength λ in the host medium of the incoming electromagnetic wave belongs to the visible light spectrum.

### Claim 12 (depends on 1)

The device according to claim 1, wherein at least one of the first material and second the material is selected from the group consisting of glass, plastic, a polymer material, oxides, and nitrides.

### Claim 13

An optical manipulation system comprising:
a device configured to radiate a focused electromagnetic beam in a dielectric host medium having a first refractive index n1 when an incoming electromagnetic wave illuminates a first face of the device, wherein the device comprises:
a first material having a second refractive index n2 and having a first width W1 along a first direction of extension of the first face; and
a second material in contact with the first material and having a third refractive index n3, wherein the second material has a second width W2 along the first direction,
where n1<n3<n2, and where W1+W2 is greater than a wavelength λ in the host medium of the incoming electromagnetic wave, the first material and the second material extending along a second direction orthogonal to the first face from the first face up to a radiating face of each material, opposite to the first face, the first material and the second material having respectively a first height H1 and a second height H2 along the second direction, where |H2−H1|≤λ/4;
wherein the device comprises, when the device is in contact with the dielectric host medium and when the incoming electromagnetic wave illuminates the first face:
a first contact area between the dielectric host medium and the first material, the first contact area radiating a first jet beam in a near field zone;
a second contact area between the first material and the second material, the second contact area radiating a second jet beam in the near field zone; and
a third contact area between the second material and the dielectric host medium, the third contact area radiating a third jet beam in the near field zone,
wherein the focused electromagnetic beam results from a combination of at least two beams among the first jet beam, the second jet beam, and the third jet beam, wherein a direction of propagation of the focused electromagnetic beam is tilted with respect to a direction of propagation of the incoming electromagnetic wave; and
an electromagnetic source configured to generate the incoming electromagnetic wave.

### Claim 14 (depends on 1)

The device according to claim 1, wherein the device is configured to trap or move microparticles or nanoparticles in the dielectric host medium.

### Claim 15

A method comprising:
trapping or moving micro or nanoparticles in a dielectric host medium,
wherein trapping or moving the micro or nanoparticles in the dielectric host medium uses a device configured to radiate a focused electromagnetic beam in a dielectric host medium having a first refractive index n1 when an incoming electromagnetic wave illuminates a first face of the device, wherein the device comprises:
a first material having a second refractive index nz and having a first width W1 along a first direction of extension of the first face; and
a second material in contact with the first material and having a third refractive index n3, wherein the second material has a second width W2 along the first direction,
where n1<n3<n2, and where W1+W2 is greater than a wavelength λ in the host medium of the incoming electromagnetic wave, the first material and the second material extending along a second direction orthogonal to the first face from the first face up to a radiating face of each material, opposite to the first face, the first material and the second material having respectively a first height H1 and a second height H2 along the second direction, where |H2−H1|≤μ/4;
wherein the device comprises, when the device is in contact with the dielectric host medium and when the incoming electromagnetic wave illuminates the first face:
a first contact area between the dielectric host medium and the first material, the first contact area radiating a first jet beam in a near field zone;
a second contact area between the first material and the second material, the second contact area radiating a second jet beam in the near field zone; and
a third contact area between the second material and the dielectric host medium, the third contact area radiating a third jet beam in the near field zone,
wherein the focused electromagnetic beam results from a combination of at least two beams among the first jet beam, the second jet beam, and the third jet beam, wherein a direction of propagation of the focused electromagnetic beam is tilted with respect to a direction of propagation of the incoming electromagnetic wave.

### Claim 16 (depends on 1)

The device according to claim 1, wherein the host medium surrounds the device.

### Claim 17 (depends on 13)

The optical manipulation system according to claim 13, wherein the host medium surrounds the device.

### Claim 18 (depends on 15)

The method according to claim 15, wherein the host medium surrounds the device.