# US 12,214,380 B2 · Capacitive micromachined ultrasonic transducer

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- Number: US 12,214,380 B2
- Document ID: US12214380B2
- Status: Granted
- Kind: B2
- Application number: 16/775,271
- Filed: 2020-01-29
- Published: 2020-07-30
- Granted: 2025-02-04
- Earliest claimed: 2019-01-29
- Assignees: Korea Institute of Science and Technology; Inha University Research and Business Foundation; Seoul National University Hospital
- Applicants: Korea Institute of Science and Technology; Inha University Research and Business Foundation; Seoul National University Hospital
- Inventors: Byung Chul Lee; Rino Choi; Whal Lee
- Web page: https://patentgrep.com/patent/US12214380B2

## CPC

- B06B 1/0292: {Electrostatic transducers, e.g. electret-type}
- G01N 29/2406: {Electrostatic or capacitive probes, e.g. electret or cMUT-probes}
- G01N 29/245: {Ceramic probes, e.g. lead zirconate titanate [PZT] probes}
- B06B 2201/51: Electrostatic transducer
- B06B: METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, {e.g.} FOR PERFORMING MECHANICAL WORK IN GENERAL (for particular applications, see the relevant subclasses, e.g. B07B1/40, B23Q17/12, B24B31/06; measurement of mechanical vibrations G01H; in direction finding, locating, distance or velocity measuring G01S; {generating seismic energy G01V1/02}; control of mechanical vibrations in general G05D; sound-producing devices, e.g. bells, sirens, whistles G10K, {e.g. methods or devices for transmitting, conducting, or directing sound in general G10K11/00}; generation of electrical oscillations H03B; electromechanical resonators in general H03H; electromechanical transducers {for communication techniques, e.g. microphones, speakers} H04R)
- G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q)

## Abstract

Provided is a capacitive micromachined ultrasonic transducer (CMUT) including a substrate, a top electrode provided on the substrate to be spaced apart from the substrate, a supporter made of an insulating material and coupled between the substrate and an edge of the top electrode to support and fix the edge of the top electrode and to define a gap between the substrate and the edge of the top electrode, and a plurality of nanoposts having both ends coupled and fixed to the substrate and the top electrode in the gap, and being compressible and stretchable in a longitudinal direction to at least vertically move the top electrode when power is applied to the top electrode.

## Claims

### Claim 1

A capacitive micromachined ultrasonic transducer (CMUT) comprising:
a substrate comprising a bottom electrode;
a top electrode provided over the substrate to be spaced above and apart from the substrate, the top electrode comprising a nanoplate having a nanometer-level thickness;
a supporter made of an insulating material, the supporter on a topmost surface of the substrate and in direct contact with a bottommost surface of the top electrode, the supporter extending along an outermost periphery of the substrate and the top electrode to define a continuous looped structure that supports and fixes an edge of the top electrode to an edge of the substrate and to define a gap between the topmost surface of the substrate, sidewalls of the supporter, and the bottommost surface of the top electrode, the gap comprising a vacuum sealed from an external environment by the substrate, the top electrode, and the supporter;
a plurality of nanoposts having a first end coupled and fixed directly to the topmost surface of the substrate and a second end in direct contact with the bottommost surface of the top electrode, the plurality of nanoposts in the gap vacuum sealed from the external environment, and being compressible and stretchable in a longitudinal direction to at least vertically move the top electrode when power is applied to the top electrode, wherein each of the plurality of nanoposts comprises a monocrystalline wire having a nanometer-level diameter of a semiconductor material; and
a top plate reinforcement having a bottommost surface directly on a topmost surface of the top electrode opposite the plurality of nanoposts, the top plate reinforcement extending continuously over the plurality of nanoposts and positioned to prevent portions of the top electrode directly under the top plate reinforcement from bending while being vertically moved by the plurality of nanoposts, the bottommost surface above a topmost surface of the supporter when power is not applied to the top electrode and below the topmost surface of the supporter when power is applied to the top electrode, the top plate reinforcement comprising a plurality of holes vertically offset from and alternating with the plurality of nanoposts such that portions of the top electrode exposed by respective holes of the plurality of holes may vibrate separately from a spring motion of the plurality of nanoposts;
wherein, when power of a first frequency is applied between the top electrode and the bottom electrode, the plurality of nanoposts may be compressed and stretched and the top electrode coupled to the plurality of nanoposts may vertically move together with the top plate reinforcement; and
wherein, when power of a second frequency is applied between the top electrode and the bottom electrode, the plurality of nanoposts do not compress or stretch and the portions of the top electrode exposed by respective holes of the plurality of holes operate at the second frequency independently of motion of the plurality of nanoposts.

### Claim 2 (depends on 1)

The CMUT of claim 1, wherein each of the plurality of nanoposts comprises a lower reinforcement having a larger cross-sectional area compared to a body at a lower part of the nanopost in contact with the substrate, to increase coupling force to the substrate.

### Claim 3 (depends on 1)

The CMUT of claim 1, wherein each of the plurality of nanoposts comprises an upper reinforcement having a larger cross-sectional area compared to a body at an upper part of the nanopost in contact with the top electrode, to increase coupling force to the top electrode.

### Claim 4 (depends on 1)

The CMUT of claim 1, wherein each of the plurality of nanoposts comprises:
a body having a nano-diameter and extending in a longitudinal direction between the substrate and the top electrode;
an upper reinforcement having a larger cross-sectional area compared to the body at an upper part of the nanopost in contact with the top electrode, to increase coupling force to the top electrode; and
a lower reinforcement having a larger cross-sectional area compared to the body at a lower part of the nanopost in contact with the substrate, to increase coupling force to the substrate.

### Claim 5 (depends on 4)

The CMUT of claim 4, wherein a cross-sectional area of the upper reinforcement is gradually increased in a direction from the body toward the top electrode, and
wherein a cross-sectional area of the lower reinforcement is gradually increased in a direction from the body toward the substrate.

### Claim 6 (depends on 1)

The CMUT of claim 1, wherein each of the plurality of nanoposts comprises a multilayer structure of a plurality of different monocrystalline materials to adjust a ratio of stretchability and compressibility of the nanopost.

### Claim 7 (depends on 6)

The CMUT of claim 6, wherein the plurality of monocrystalline materials at least comprise a piezoelectric material capable of vibrating when an electrical signal is received.

### Claim 8 (depends on 1)

The CMUT of claim 1, wherein the plurality of nanoposts have a plurality of diameters, and
wherein a diameter of at least one first nanopost provided at a center portion of the top electrode is greater than the diameter of at least one second nanopost provided at an edge portion of the top electrode.

### Claim 9 (depends on 1)

The CMUT of claim 1, wherein a density of the plurality of nanoposts is greater at a center portion compared to an edge portion of the top electrode.

### Claim 10 (depends on 1)

The CMUT of claim 1, further comprising a protrusion provided on the substrate to be spaced apart from the top electrode and to surround and be spaced apart from lower parts of the plurality of nanoposts,
wherein the substrate is made of a conductive material to function as the bottom electrode, and
wherein the protrusion and the plurality of nanoposts are formed by etching the substrate.

### Claim 11 (depends on 1)

The CMUT of claim 1, further comprising a bottom plate provided on the substrate in the gap to be spaced apart from the top electrode and to surround and be spaced apart from at least lower parts of the plurality of nanoposts,
wherein the substrate is made of an insulating material, and
wherein the bottom plate is made of a conductive material to function as the bottom electrode.

### Claim 12 (depends on 1)

The CMUT of claim 1, wherein the substrate comprises a semiconductor wafer and an integrated chip (IC) provided on the semiconductor wafer, and
wherein the plurality of nanoposts are monolithically formed on the substrate by using a semiconductor process.

### Claim 13

A capacitive micromachined ultrasonic transducer (CMUT) comprising:
an insulating first substrate;
a conductive second substrate provided on the first substrate, comprising a plurality of through holes, and functioning as a bottom electrode;
a top electrode provided over the second substrate to be spaced above and apart from the second substrate, the top electrode comprising a nanoplate having a nanometer-level thickness;
a supporter made of an insulating material, the supporter on a topmost surface of the first substrate and in direct contact with a bottommost surface of the top electrode, the supporter extending along an outermost periphery of the first substrate and the top electrode to define a continuous looped structure that supports and fixes an edge of the top electrode to an edge of the first substrate and to define a gap between the topmost surface of the first substrate, sidewalls of the supporter, and the bottommost surface of the top electrode, the gap comprising a vacuum sealed from an external environment by the substrate, the top electrode, and the supporter; and
a plurality of nanoposts having a first end coupled and fixed directly to the topmost surface of the first substrate and a second end in direct contact with the bottommost surface of the top electrode though the plurality of through holes in the gap vacuum sealed from the external environment and being stretchable and compressible in a longitudinal direction to at least vertically move the top electrode when power is applied between the top electrode and the bottom electrode, wherein each of the plurality of nanoposts comprises a monocrystalline wire having a nanometer-level diameter of a semiconductor material; and
a top plate reinforcement having a bottommost surface directly on a topmost surface of the top electrode opposite the plurality of nanoposts, the top plate reinforcement extending continuously over the plurality of nanoposts and positioned to prevent portions of the top electrode directly under the top plate reinforcement from bending while being vertically moved by the plurality of nanoposts, the bottommost surface above a topmost surface of the supporter when power is not applied to the top electrode and below the topmost surface of the supporter when power is applied to the top electrode, the top plate reinforcement comprising a plurality of holes vertically offset from and alternating with the plurality of nanoposts such that portions of the top electrode exposed by respective holes of the plurality of holes may vibrate separately from a spring motion of the plurality of nanoposts;
wherein, when power of a first frequency is applied between the top electrode and the bottom electrode, the plurality of nanoposts may be compressed and stretched and the top electrode coupled to the plurality of nanoposts may vertically move together with the top plate reinforcement; and
wherein, when power of a second frequency is applied between the top electrode and the bottom electrode, the plurality of nanoposts do not compress or stretch and the portions of the top electrode exposed by respective holes of the plurality of holes operate at the second frequency independently of motion of the plurality of nanoposts.
