Substrate processing apparatus and substrate processing method

A substrate processing apparatus for processing a substrate with a processing liquid, comprising:

• a first supply liquid line in which a first supply liquid continuously flows, said first supply liquid line forming a first circulation flow path;
• a first concentration measurement part provided in said first supply liquid line, for measuring a dissolved concentration of a predetermined gas in said first supply liquid;
• a first filter provided in said first supply liquid line of said first circulation flow path;
• a second supply liquid line in which a second supply liquid continuously flows, said second supply liquid line forming a second circulation flow path, wherein the second supply liquid has a dissolved concentration of said gas which is lower than that of said first supply liquid;
• a second concentration measurement part provided in said second supply liquid line, for measuring a dissolved concentration of said gas in said second supply liquid;
• a second filter provided in said second supply liquid line of said second circulation flow path;
• a third supply liquid line in which a third supply liquid continuously flows;
• a third concentration measurement part provided in said third supply liquid line, for measuring a dissolved concentration of said gas in said third supply liquid;
• a first processing liquid adjustment part for mixing said first supply liquid, said second supply liquid, and said third supply liquid, to thereby generate a first processing liquid in which a dissolved concentration of said gas is adjusted;
• and
• a first substrate processing part for processing a first substrate by supplying said first substrate with said first processing liquid;
• wherein said first processing liquid adjustment part comprises:
• a first branch line branched from said first circulation flow path so that said first supply liquid flows in said first branch line, wherein the first branch line comprises a first end that is directly connected to said first supply liquid line;
• a second branch line branched from said second circulation flow path so that said second supply liquid flows in said second branch line, wherein the second branch line comprises a first end that is directly connected to said second supply liquid line;
• a third branch line in which said third supply liquid flows, wherein the third branch line comprises a first end that is directly connected to a connection position on said third supply liquid line, wherein said connection position is upstream of the third concentration measurement part;
• a first flow rate adjustment part provided in said first branch line or said second branch line;
• a second flow rate adjustment part provided in one of said first to third branch lines, wherein the one of said first to third branch lines is different from the branch line comprising the first flow rate adjustment part, and
• a mixing part to which a second end of said first branch line, a second end of said second branch line, and a second end of said third branch line are connected, for mixing said first supply liquid, said second supply liquid, and said third supply liquid, to generate said first processing liquid,
• and wherein said first supply liquid and second supply liquid are pure water and said third supply liquid is a liquid other than pure water, and
• wherein a control part is configured to control said first flow rate adjustment part and said second flow rate adjustment part on a basis of respective measured values of said first to third concentration measurement parts so that a dissolved concentration of said gas in said first processing liquid becomes a set value.