US 12,210,127 B2 · Detection substrate, method for manufacturing the same and flat panel detector

Abstract

The present disclosure provides a detection substrate, a method for manufacturing the same and a flat panel detector. The detection substrate includes a base substrate and at least one pixel unit, the pixel unit includes: a transistor, an oxide layer, a reading electrode, and a photoelectric conversion structure sequentially arranged in a direction away from the base substrate, the reading electrode is electrically connected with the photoelectric conversion structure, the oxide layer is positioned between the transistor and the reading electrode, the oxide layer has a first through hole therein, an orthographic projection of the oxide layer on the base substrate at least covers that of the transistor on the base substrate, the reading electrode is electrically connected with the transistor through the first through hole, orthographic projections of the first through hole and the transistor on the base substrate are not overlapped with each other.

Claims20

Dependent claims

A detection substrate, comprising a base substrate and at least one pixel unit disposed on the base substrate, the pixel unit comprising:

a transistor, an oxide layer, a reading electrode, and a photoelectric conversion structure sequentially arranged in a direction away from the base substrate, wherein
the reading electrode is electrically connected with the photoelectric conversion structure,
the oxide layer is positioned between a layer where the transistor is located and a layer where the reading electrode is located, the oxide layer is provided with a first through hole therein, and an orthographic projection of the oxide layer on the base substrate at least covers an orthographic projection of the transistor on the base substrate, and
the reading electrode is electrically connected with the transistor through the first through hole, and an orthographic projection of the first through hole on the base substrate is not overlapped with the orthographic projection of the transistor on the base substrate.

1 more element

A method for manufacturing a detection substrate, comprising:

forming at least one pixel unit on a base substrate, wherein
the forming the at least one pixel unit further comprises:
forming a transistor on the base substrate;
forming an oxide layer on the base substrate on which the transistor is formed, wherein a first through hole is formed in the oxide layer, and an orthographic projection of the oxide layer on the base substrate at least covers an orthographic projection of the transistor on the base substrate;
and
sequentially forming a reading electrode and a photoelectric conversion structure on the base substrate on which the oxide layer is formed, wherein the reading electrode is electrically connected with the photoelectric conversion structure, the reading electrode is electrically connected with the transistor through the first through hole, and an orthographic projection of the first through hole on the base substrate is not overlapped with the orthographic projection of the transistor on the base substrate.

3 more elements

Dependencies are inferred from the claim text.

Detection substrate, method for manufacturing the same and flat panel detector

Life of this patent

Detection substrate, method for manufacturing the same and flat panel detector

Life of this patent

Abstract

Claims20