Resin composition and filter element

A resin composition comprising:

• a black coloring agent (A);
• an ethylenically-unsaturated monomer (B);
• a solvent (C);
• a resin (D);
• a photoinitiator (E));
• and
• a fluorine-based surfactant (F),
• wherein the black coloring agent (A) comprises a titanium black (A-1) and a carbon black (A-2) each having a particle size of less than 100 nm, and based on a total usage amount of 100 parts by weight of the titanium black (A-1) and the carbon black (A-2), a usage amount of the titanium black (A-1) is 50 parts by weight to 75 parts by weight,
• wherein based on a usage amount of 100 parts by weight of the resin (D), a usage amount of the black coloring agent (A) is 25 parts by weight to 430 parts by weight, a usage amount of the ethylenically-unsaturated monomer (B) is 78 parts by weight to 115 parts by weight, a usage amount of the solvent (C) is 965 parts by weight to 2550 parts by weight, a usage amount of the photoinitiator (E) is 4 parts by weight to 12 parts by weight, and a usage amount of the fluorine-based surfactant (F) is 1 part by weight to 3 parts by weight,
• wherein the resin (D) is formed by a monomer represented by the following Formula (d-1),
• wherein the ethylenically-unsaturated monomer (B) comprises dipentaerythritol hexaacrylate and a polyfunctional polyurethane acrylate having 10 or more functional groups,
• wherein the solvent (C) comprises at least one of a compound represented by the following Formula (C-1) and a compound represented by the following Formula (C-2),
• in Formula (C-1), R1 and R2 are respectively an alkyl group, and m is 1 or 2,
• in Formula (C-2), R3 and R4 are respectively an alkyl group, and n is an integer greater than or equal to 1, and
• wherein the photoinitiator (E) comprises an oxime-based photoinitiator (E-1) and an acetophenone-based photoinitiator (E-2),
• such that a resolution, as determined by a smallest dimension of an area with complete pattern integrity of a dot pattern of a cured film obtained after coating the resin composition on a substrate to form a coating film, pre-baking the coating film, exposuring the pre-baked coating film with an I-line exposure machine at a wavelength of 365 nm, developing and patterning the exposured pre-baked coating film with a developing solution, and then post-baking the patterned-developed-exposured pre-baked coating film to form the cured film, is 0.9 to 1.1 microns when a thickness of the cured film is 0.3 micron to 3.0 microns, and
• a light transmittance of the cured film at a visible wavelength of 400 nm to 700 nm is 5% to 50% with an intra-film transmittance deviation of less than 0.5% when the thickness of the cured film is between 0.3 micron and 3.0 microns.