US 12,205,794 B2 · Antenna structure and plasma generating device using same

Abstract

This invention is an antenna structure inducing plasma in a chamber with applied alternative power, comprising: a first antenna segment and a second antenna segment arranged based on a virtual central axis to have a first curvature radius and a second curvature radius respectively, the central axis crossing a first plane, and a first capacitive load electrically connecting the first antenna segment and the second antenna segment, wherein the first antenna segment extends from one end of the first capacitive load with the first curvature radius having a first length and the second antenna segment extends from other end of the first capacitive load with the second curvature radius having a second length, and wherein a sum of the first length and the second length is shorter than a circumference of the first curvature radius or the second curvature radius.

Claims22

Dependent claims

An antenna structure inducing a plasma in a chamber by receiving AC power, comprising:

a first and second antenna segment, arranged on a first plane intersecting a virtual central axis, wherein the first antenna segment has a first radius of curvature about the central axis and the second antenna segment has a second radius of curvature about the central axis;
and
a first capacitive load, electrically connecting the first antenna segment and the second antenna segment in series;
wherein the first antenna segment, having the first radius of curvature, extends from one end of the first capacitive load by a first length, and the second antenna segment, having the second radius of curvature, extends from other end of the first capacitive load by a second length, and
wherein a total of the first length and the second length is less than a circumference corresponding to the first radius of curvature or the second radius of curvature.

2 more elements

A plasma generating device, comprising:

a plasma generating unit, including an inner space where a plasma is induced;
and
a first antenna structure, having a first radius of curvature about a virtual central axis and disposed outside of the plasma generating unit;
wherein the first antenna structure includes a plurality of first antenna segments having the first radius of curvature and at least one first capacitive load arranged between the plurality of first antenna segments such that the plurality of first antenna segments are electrically connected in series,
wherein the plurality of first antenna segments overlap at least partially with a virtual first plane perpendicular to the central axis, and
wherein each of the plurality of first antenna segments has a first length, and a total length of the plurality of first antenna segments is less than a circumference corresponding to the first radius of curvature.

3 more elements

Dependencies are inferred from the claim text.

Antenna structure and plasma generating device using same

Life of this patent

Antenna structure and plasma generating device using same

Life of this patent

Abstract

Claims22