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US 12,204,242 B2Granted
Master mold for pattern transfer
AssigneeUniversity of Massachusetts
InventorsJames J. Watkins, Feyza Dundar
Life of this patent
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Abstract
In various embodiments, the present invention provides a method comprising: disposing upon a first substrate, a first coating; texturing the first coating with a stamp; treating the textured first coating to form a master mold; where the master mold contains a mirror image of the texture contained in the first coating; and transferring the texture from the master mold to a second substrate.
Claims20
A method comprising:
- disposing upon a first substrate, a first coating comprising metal oxide nanoparticles dispersed in a solvent, wherein the metal oxide nanoparticles are 80 wt % or more of the first coating;
- texturing the first coating with a microporous solvent-permeable stamp, wherein the stamp is an elastomeric stamp that comprises a texture and has micropores that absorb the solvent, the stamp extracts the solvent from the first coating while texturing the coating, and the texturing is performed in a high humidity environment, wherein the high humidity environment has a relative humidity of 70% or more;
- transferring solvent away from the textured first coating with the microporous solvent-permeable stamp until the first coating is substantially devoid of the solvent;
- treating the textured first coating to form a master mold;
- wherein the master mold contains a mirror image of the texture contained in the textured, solvent-permeable stamp;
- and
- transferring the texture from the master mold to a second substrate.
4 more elements
A method for residual-layer free imprinting comprising:
- disposing upon a first substrate, a first coating comprising metal oxide nanoparticles dispersed in a solvent, wherein the metal oxide nanoparticles are 80 wt % or more of the first coating;
- texturing the first coating while transferring the solvent away from the first coating by using a microporous solvent-permeable stamp, wherein the stamp is an elastomeric stamp comprising:
- a texture configured for texturing the first coating, surface contact angles configured for dewetting the solvent, and micropores configured for absorbing the solvent and diffusing the solvent through the stamp and away from the first coating;
- transferring solvent away from the textured first coating until the first coating is substantially devoid of the solvent;
- and
- calcining the textured first coating to form a residual-layer free master mold.
3 more elements
Dependencies are inferred from the claim text.