# US 12,203,651 B2 · Apparatus for treating gaseous pollutant with plasma

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 12,203,651 B2
- Document ID: US12203651B2
- Status: Granted
- Kind: B2
- Application number: 17/774,712
- Filed: 2019-11-07
- Published: 2023-01-05
- Granted: 2025-01-21
- Earliest claimed: 2019-11-07
- Assignees: Bht Services Pte. Ltd.
- Applicants: Bht Services Pte. Ltd.
- Inventors: Chee Wei Chan
- Web page: https://patentgrep.com/patent/US12203651B2

## CPC

- F23G 7/063: {electric heating}
- B01D 53/76: Gas phase processes, e.g. by using aerosols
- H01P 7/06: Cavity resonators
- H05H 1/30: using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/28 takes precedence)
- H05H 1/4622: {using waveguides}
- F23G 2204/201: Plasma
- F23G 2204/203: Microwave
- F23G 2209/14: Gaseous waste or fumes
- H05H 2245/10: Treatment of gases
- F23G: CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
- B01D: SEPARATION (separating solids from solids by wet methods B03B, B03D; by pneumatic jigs or tables B03B; by other dry methods B07; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields B03C; centrifuges, vortex apparatus B04; presses per se for squeezing-out liquid from liquid-containing material B30B9/02; treatment of water C02F, e.g. softening by ion-exchange C02F1/42; {arrangements of air intake cleaners in gas turbine plants F02C7/05} ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation F24F13/28)
- H01P: WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE (operating at optical frequencies G02B)
- H05H: PLASMA TECHNIQUE (apparatus or processes specially adapted for producing X-rays H05G2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS

## Abstract

An apparatus for treating gaseous pollutant with plasma comprises a microwave source generating a microwave oscillation; a waveguide component coupled to the microwave source; and a resonant cavity coupled to the waveguide component, the microwave oscillation is substantially propagated toward a waveguide direction, the resonant cavity comprises a first chamber and a second chamber, the waveguide direction is substantially parallel to a reference axis defined in the first chamber, the first chamber has an inner wall surrounding the reference axis, the inner wall comprises a first inner wall obliquely inclined toward the reference axis and a second inner wall substantially parallel in respect to the reference axis relatively, an area of the first inner wall is larger than that of the second inner wall so that the first chamber has a tapered space, and the microwave oscillation interacts with an ignition gas in the second chamber to generate a torch.

## Claims

### Claim 1

An apparatus for treating gaseous pollutant with plasma comprising:
a microwave source configured to generate a microwave oscillation;
a waveguide component coupled to the microwave source and configured to receive the microwave oscillation such that the microwave oscillation is propagated through the waveguide component; and
a resonant cavity coupled to the waveguide component such that the microwave oscillation is substantially propagated in the resonant cavity along a waveguide direction, the resonant cavity comprising a first chamber in proximity to the waveguide component and a second chamber distant from the waveguide component, the first chamber comprising an inlet end connected to the waveguide component and an outlet end opposite to the waveguide component, the second chamber comprising a communicating end communicated with the outlet end and a closed end opposite to the communicating end, the second chamber being configured to receive the microwave oscillation passed through the first chamber, the microwave oscillation interacting with an ignition gas in the second chamber to generate a torch;
wherein, the waveguide direction is substantially parallel to a reference axis defined in the first chamber, the first chamber comprises an inner wall around the reference axis and extending along the reference axis, the inner wall comprises a first region inclined to the reference axis and a second region substantially parallel in respect to the reference axis, an area of the first region is larger than that of the second region so that the first chamber comprises a tapered shaped space which becomes narrower from the inlet end to the outlet end.

### Claim 2 (depends on 1)

The apparatus for treating gaseous pollutant with plasma according to claim 1, wherein the inner wall comprises a first inner side wall and a second inner side wall opposite to the first inner side wall, and the first inner side wall and the second inner side wall respectively obliquely incline inwardly toward the reference axis from the inlet end to the outlet end.

### Claim 3 (depends on 1)

The apparatus for treating gaseous pollutant with plasma according to claim 1, wherein the inner wall comprises a first inner side wall and a second inner side wall opposite to the first inner side wall, and a width between the first inner side wall and the second inner side wall is gradually decreasing along the reference axis.

### Claim 4 (depends on 1)

The apparatus for treating gaseous pollutant with plasma according to claim 1, wherein the inner wall of the first chamber comprises a first top wall and a first bottom wall, the second chamber comprises a second top wall and a second bottom wall, and a first difference in height is provided between the second top wall and the first top wall.

### Claim 5 (depends on 1)

The apparatus for treating gaseous pollutant with plasma according to claim 1, wherein the inner wall of the first chamber comprises a first top wall and a first bottom wall, the second chamber comprises a second top wall and a second bottom wall, and a second difference in height is provided between the second bottom wall and the first bottom wall.

### Claim 6 (depends on 1)

The apparatus for treating gaseous pollutant with plasma according to claim 1, further comprising an ignition source and a dielectric tube, wherein the dielectric tube is inserted in the second chamber and comprises a first end close to the ignition source and a second end distant from the ignition source, the second chamber comprises a second top wall and a second bottom wall, the second end of the dielectric tube protrudes out from the second chamber and a third difference in height is provided between the second end of the dielectric tube and the second bottom wall of the second chamber.

### Claim 7 (depends on 1)

The apparatus for treating gaseous pollutant with plasma according to claim 1, further comprising an ignition source and a dielectric tube, wherein the dielectric tube is inserted in the second chamber, the ignition source comprises a probe component, the probe component comprises a support member and at least one tip disposed on the support member, and the tip having an outer diameter between 1.6 mm and 2 mm.

### Claim 8 (depends on 1)

The apparatus for treating gaseous pollutant with plasma according to claim 1, wherein the ignition gas is selected from a group consisting of air, nitrogen, and argon.

### Claim 9

An apparatus for treating gaseous pollutant with plasma comprising:
a microwave source configured to generate a microwave oscillation;
a waveguide component coupled to the microwave source and configured to receive the microwave oscillation such that the microwave oscillation is propagated through the waveguide component; and
a resonant cavity coupled to the waveguide component such that the microwave oscillation is substantially propagated in the resonant cavity along a waveguide direction, the resonant cavity comprising a first chamber in proximity to the waveguide component and a second chamber distant from the waveguide component, the first chamber comprising an inlet end connected to the waveguide component and an outlet end opposite to the waveguide component, the second chamber comprising a communicating end communicated with the outlet end and a closed end opposite to the communicating end, the second chamber being configured to receive the microwave oscillation passed through the first chamber, the microwave oscillation interacting with an ignition gas in the second chamber to generate a torch;
wherein, the waveguide direction is substantially parallel to a reference axis defined in the first chamber, the first chamber comprises a first inner side wall, a second inner side wall opposite to the first inner side wall, a first top wall, and a first bottom wall, the first inner side wall and the second inner side wall obliquely incline inwardly toward the reference axis from the inlet end to the outlet end.

### Claim 10 (depends on 9)

The apparatus for treating gaseous pollutant with plasma according to claim 9, wherein a width between the first inner side wall and the second inner side wall is gradually decreasing along the reference axis.

### Claim 11 (depends on 9)

The apparatus for treating gaseous pollutant with plasma according to claim 9, wherein the second chamber comprises a second top wall and a second bottom wall, and a first difference in height is provided between the second top wall and the first top wall of the first chamber.

### Claim 12 (depends on 9)

The apparatus for treating gaseous pollutant with plasma according to claim 9, wherein the second chamber comprises a second top wall and a second bottom wall, and a second difference in height is provided between the second bottom wall and the first bottom wall of the first chamber.

### Claim 13 (depends on 9)

The apparatus for treating gaseous pollutant with plasma according to claim 9, further comprising an ignition source and a dielectric tube, wherein the dielectric tube is inserted in the second chamber and comprises a first end in proximity to the ignition source and a second end distant from the ignition source, the second chamber comprises a second top wall and a second bottom wall, the second end of the dielectric tube protrudes out from the second chamber and a third difference in height is provided between the second end of the dielectric tube and the second bottom wall of the second chamber.

### Claim 14 (depends on 9)

The apparatus for treating gaseous pollutant with plasma according to claim 9, further comprising an ignition source and a dielectric tube, wherein the dielectric tube is inserted in the second chamber, the ignition source comprises a probe component, the probe component comprises a support member and at least one tip disposed on the support member, and the tip having an outer diameter between 1.6 mm and 2 mm.