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US 12,201,936 B2Granted
Gas recovery method
AssigneeGas Recovery and Recycle Limited
InventorRobert Bruce Grant
Life of this patent
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Abstract
The invention provides a process of purifying a fluid useful in a manufacturing process, particularly in the manufacture of silicon wafers, by removing one or more impurities; and apparatus for use in the process.
Claims16
A process for purifying a fluid, the process comprising the steps of:
- 1.1 Providing an insulated adsorption vessel (1) comprising an adsorptive media;
- 1.2 Providing a first fluid F1;
- 1.3 Cooling the insulated adsorption vessel (1) and/or cooling the first fluid F1, to an operating temperature T1 in the range of from −40° C. to −130° C.;
- 1.4 Contacting the first fluid F1 with the insulated adsorption vessel (1) to remove one or more impurities G1, thereby providing a resulting purified fluid F2;
- 1.5 Collecting the resulting purified fluid F2;
- and
- 1.6 Regenerating the insulated adsorption vessel (1) by vacuum at a pressure of 2.0×10−3 mb or less whilst maintaining the temperature of the insulated adsorption vessel (1) at a temperature in the range T1 to T1+50° C.
4 more elements
Dependencies are inferred from the claim text.