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AssigneeApplied Materials, Inc.
InventorsMinrui Yu, Wenhui Wang, Jaesoo Ahn, Jong Mun Kim, Sahil Patel, Lin Xue, Chando Park, Mahendra Pakala, Chentsau Chris Ying, Huixiong Dai, Christopher S. Ngai
Estimating the term…
Embodiments of the present disclosure generally include spin-orbit torque magnetoresistive random-access memory (SOT-MRAM) devices and methods of manufacture thereof. The SOT-MRAM devices described herein include an SOT layer laterally aligned with a magnetic tunnel junction (MTJ) stack and formed over a trench in an interconnect. Thus, the presence of the SOT layer outside the area of the MTJ stack is eliminated, and electric current passes from the interconnect to the SOT layer by SOT-interconnect overlap. The devices and methods described herein reduce the formation of shunting current and enable the MTJ to self-align with the SOT layer in a single etching process.
A method of forming a memory device, comprising:
Dependencies are inferred from the claim text.