Substrate transfer method and substrate transfer system

A substrate transfer method of transferring a substrate to a target position of a second stage by a substrate transfer system including a substrate transfer mechanism provided with a holder configured to hold the substrate and configured to transfer the substrate from a first stage to the second stage, a first photoelectric sensor configured to measure a position of the substrate at a first measurement position adjacent to the first stage, and a second photoelectric sensor configured to measure the position of the substrate at a second measurement position, wherein the substrate transfer method comprises:

• receiving the substrate at the first stage by the holder;
• causing the substrate held by the holder to pass through the first photoelectric sensor, and calculating a first true deviation amount based on positions of the holder and the substrate at the first measurement position, wherein the first true deviation amount is obtained from a detection value detected by the first photoelectric sensor and a thermal displacement amount of the holder at the first measurement position;
• causing, when transferring the substrate held by the holder toward the second stage, the substrate to pass through the second photoelectric sensor, and calculating a second true deviation amount based on positions of the holder and the substrate at the second measurement position, wherein the second true deviation amount is obtained from a detection value detected by the second photoelectric sensor and a thermal displacement amount of the holder at the second measurement position;
• reflecting a difference between the first true deviation amount and the second true deviation amount to a physical model configured to estimate the thermal displacement amount of the holder at the second measurement position, and correcting the physical model such that a model error is reduced;
• calculating a position correction amount of the holder at the second stage from the thermal displacement amount of the holder at the second measurement position, wherein the position correction amount is estimated from the corrected physical model, a deviation amount between the holder and the substrate, wherein the deviation amount is the detection value detected by the second photoelectric sensor, and a thermal displacement amount of the holder at the second stage;
• and
• controlling the substrate transfer mechanism based on the position correction amount to perform a position correction of the holder, and deliver the substrate on the holder to the second stage.