Substrate processing method and substrate processing system

A substrate processing method, comprising:

• loading a substrate on which an exposed photoresist layer is coated into a first process chamber;
• performing a chemical process using a developer on the substrate;
• performing a rinse process using a rinse solution on the substrate;
• supplying a mixed solution of a non-polar organic solvent and a surfactant on the substrate to perform a first substitution step;
• supplying the non-polar organic solvent on the substrate to perform a second substitution step;
• performing a substitution process of the first substitution process and the second substitution process a plurality of times until the rinse solution remaining on the substrate is less than a predetermined value that is greater than zero;
• loading the substrate into a second process chamber;
• and
• performing a supercritical fluid drying process on the substrate.