Magnetized plasmoid injection device

A magnetized plasmoid injection device comprising:

• a cylindrical external electrode;
• a cylindrical internal electrode coaxially disposed inside the external electrode;
• a plasma generating gas supply unit configured to supply plasma generating gas in a pulse shape between the external electrode and the internal electrode;
• a magnetic field generation unit configured to apply a magnetic field that generates magnetized plasmoid between the external electrode and the internal electrode;
• a plasma power supply configured to apply a discharge voltage between the external electrode and the internal electrode;
• and
• an impurity generation unit configured to cause the magnetized plasmoid to contain an impurity, the impurity generation unit including a cover electrode that opens to the external electrode, a thin-rod electrode that is located inside the cover electrode and is formed of an impurity, an impurity generation power supply that applies a voltage to the cover electrode and the thin-rod electrode, and a power supply control unit,
• wherein the plasma generating gas supply unit has a nozzle that opens to the external electrode, and the nozzle is disposed along a tangential direction of an annular shape formed by the external electrode and the internal electrode, such that a gas ejection direction from the nozzle is the tangential direction of the annular shape, and
• wherein the impurity constituting the thin-rod electrode is ionized or particle-like, and the power supply control unit is configured to control the voltage applied by the impurity generation power supply to the cover electrode and the thin-rod electrode to scatter the impurity from the thin-rod electrode and to diffuse the impurity into a magnetized plasmoid generation space formed between the external electrode and the internal electrode.