Monolithic high refractive index photonic devices

A method of fabricating a high refractive index photonic device, the method comprising:

• partially polymerizing a polymerizable composition to a liquid form by heating in a range of 100° C. to 125° C. to provide a partially polymerized composition;
• disposing the partially polymerized composition on a first surface of a first substrate after heating the first substrate to a temperature between 100° C. and 250° C., wherein the first surface is a patterned surface including one or more nanostructures;
• contacting the partially polymerized composition with a first surface of a second substrate, thereby spreading the partially polymerized composition on the first surface of the first substrate, wherein contacting the partially polymerized composition with a first surface of a second substrate comprises:
• forming an acute angle between the first substrate and the second substrate, and
• reducing the value of the acute angle by rotating the second substrate toward the first substrate until the first substrate and the second substrate are parallel to each other and are separated by a predefined distance;
• curing the partially polymerized composition to yield a polymeric structure having a first surface in contact with the first surface of the first substrate, having a second surface opposite the first surface of the polymeric structure and in contact with the first surface of the second substrate, and having a selected residual layer thickness between the first surface of the polymeric structure and the second surface of the polymeric structure in a range of 10 μm to 1 cm.