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US 12,194,566 B2Granted
Method for producing graphene
AssigneeASUSTeK COMPUTER INC.
InventorsYun-Wei Tsai, Hsien-Yeh Chen, Shu-Man Hu, Chin-Yun Lee, Yi-Chang Wu, Yen-Hsun Lin, Kuo-Wei Tsao, Chi-Liang Tsai
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Abstract
A method for producing graphene, configured for forming a graphene layer on a surface of an object. The method includes steps of: depositing a poly-p-xylene material layer on the surface: and converting the poly-p-xylene material layer into a graphene layer by using a laser sintering process or a plasma-assisted sintering process.
Claims12
A method for producing graphene, configured for forming a graphene layer on a surface of an object, the method comprising steps of:
- depositing a poly-p-xylene material layer on the surface;
- and
- converting the poly-p-xylene material layer into a graphene layer by using a laser sintering process or a plasma-assisted sintering process,
- wherein the step of depositing the poly-p-xylene material layer on the surface comprises:
- cleaving a di-p-xylylene material to produce a p-xylylene material;
- and
- delivering the p-xylylene material to the surface with a carrier gas to form the poly-p-xylene material layer,
- wherein a deposition rate of the poly-p-xylene material layer is 200 nm/h to 500 nm/h.
5 more elements
Dependencies are inferred from the claim text.