# US 12,193,215 B2 · Semiconductor device and method for fabricating the same

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- Number: US 12,193,215 B2
- Document ID: US12193215B2
- Status: Granted
- Kind: B2
- Application number: 17/841,755
- Filed: 2022-06-16
- Published: 2022-09-29
- Granted: 2025-01-07
- Earliest claimed: 2019-06-14
- Assignees: SK hynix Inc.
- Applicants: SK hynix Inc.
- Inventors: Hyung-Jin Park
- Web page: https://patentgrep.com/patent/US12193215B2

## CPC

- H10B 12/315: {with the capacitor higher than a bit line}
- G11C 5/063: {Voltage and signal distribution in integrated semi-conductor memory access lines, e.g. word-line, bit-line, cross-over resistance, propagation delay}
- H10B 12/0335: {Making a connection between the transistor and the capacitor, e.g. plug}
- H10B 12/05: {Making the transistor}
- H10B 12/056: {the transistor being a FinFET}
- H10B 12/36: {the transistor being a FinFET}
- H10B 12/482: {Bit lines}
- H10B 12/488: {Word lines}
- H10B: ELECTRONIC MEMORY DEVICES
- G11C: STATIC STORES (semiconductor memory devices H10B)

## Abstract

A semiconductor device includes a stacked line structure including a bit line over a substrate, an active layer positioned at a higher level than the stacked line structure and parallel to the bit line, a capacitor positioned at a higher level than the active layer, a first plug extending downwardly to be coupled to the bit line through the active layer, a second plug formed between the active layer and the capacitor, and a word line extending in a direction that intersects with the bit line while intersecting with the active layer.

## Claims

### Claim 1

A method for fabricating a semiconductor device, the method comprising:
preparing a plurality of stacked line structures including a bit line over a substrate and a line-type active layer over the bit line, wherein longest directions of the bit line and the line-type active layer extends in a first direction;
forming a plurality of island-type active layers by cutting the line-type active layer;
forming a first plug for electrically coupling the bit line to the island-type active layers, wherein a longest direction of the first plug extends in a second direction perpendicular to the first direction;
forming a word line over the island-type active layers;
forming a second plug which is coupled to both sides of each of the island-type active layers; and
forming a plurality of capacitors that are respectively coupled to the second plugs.

### Claim 2 (depends on 1)

The method of claim 1, wherein the preparing of the plurality of the stacked line structures each of which includes the bit line and the line-type active layer over the substrate includes:
preparing a first substrate that includes a conductive material and a first bonding layer;
preparing a second substrate that includes a preliminary active layer and a second bonding layer;
forming an initial substrate stack by bonding the first bonding layer of the first substrate and the second bonding layer of the second substrate; and
forming the bit line and the line-type active layer by patterning the preliminary active layer and the conductive material of the initial substrate stack in a line shape.

### Claim 3 (depends on 2)

The method of claim 2, wherein the first bonding layer and the second bonding layer include a dielectric material.

### Claim 4 (depends on 1)

The method of claim 1, wherein the bit line includes a metal-based material.

### Claim 5 (depends on 1)

The method of claim 1, wherein the line-type active layer includes a silicon-based material.

### Claim 6 (depends on 1)

The method of claim 1, wherein the forming of the first plug which is coupled to the bit line through the island-type active layers includes:
forming a contact hole that exposes the bit line through the island-type active layer;
forming a metal plug in the contact hole; and
forming a silicon plug which is doped with an impurity over the metal plug.

### Claim 7 (depends on 1)

The method of claim 1, wherein each of the first plug and the second plug includes polysilicon which is doped with an impurity.

### Claim 8 (depends on 7)

The method of claim 7, further comprising:
performing an annealing process for diffusing the impurity into the active layer, after the forming of the second plug which is coupled to both sides of each of the island-type active layers,
wherein the diffusion of the impurity forms a first source/drain region which is coupled to the first plug and a second source/drain region which is coupled to the second plug.

### Claim 9 (depends on 1)

The method of claim 1, further comprising:
forming a first isolation layer that includes an air gap positioned between the stacked line structures, after the preparing of the plurality of the stacked line structures each of which includes the bit line and the line-type active layer over the substrate.

### Claim 10 (depends on 9)

The method of claim 9, further comprising:
forming a second isolation layer which is positioned between the island-type active layers, after the forming of the plurality of the island-type active layers by cutting the line active layer.

### Claim 11

A method for fabricating a semiconductor device, comprising:
preparing a plurality of stacked line structures including a bit line over a substrate, a first layer over the bit line, and a line-type active layer over the first layer, wherein the bit line and the line-type active layer is electrically isolated by a first layer, wherein longest directions of the bit line and the line-type active layer extends in a first direction;
forming a plurality of island-type active layers by cutting the line-type active layer;
forming a first plug penetrating the first layer to be electrically coupled to the bit line and the island-type active layer, wherein a longest direction of the first plug extends in a second direction perpendicular to the first direction;
forming a word line over the island-type active layers;
forming a second plug which is coupled to both sides of each of the island-type active layers; and
forming a plurality of capacitors that are respectively coupled to the second plugs.