Integrated substrate measurement system to improve manufacturing process performance

A method comprising:

• identifying a first substrate at a manufacturing system by a controller which is operatively coupled to the manufacturing system and a second substrate at the manufacturing system by the controller, wherein the first substrate is associated with a first process recipe and the second substrate is associated with a second process recipe;
• obtaining a first set of measurements for the first substrate from a substrate measurement subsystem;
• obtaining a second set of measurements for the first substrate from a chamber of the manufacturing system;
• and generating a mapping between the first set of measurements and the second set of measurements of the substrate;
• storing the first set of measurements mapped to the second set of measurements;
• determining, based on the obtained first set of measurements for the first substrate mapped to the obtained second set of measurements for the first substrate, whether to modify the second process recipe associated with the second substrate by at least one of:
• modifying an operation of the second process recipe, or
• generating an instruction to prevent completion of execution of one or more operations of the second process recipe;
• and
• providing, via a user interface of a client device connected to the manufacturing system, a notification of the modification to the one or more operations of the second process recipe.