# US 12,191,127 B2 · Apparatus for physical vapor deposition and method for forming a layer > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,191,127 B2 - Document ID: US12191127B2 - Status: Granted - Kind: B2 - Application number: 16/653,339 - Filed: 2019-10-15 - Published: 2020-05-21 - Granted: 2025-01-07 - Earliest claimed: 2018-10-31 - Assignees: Taiwan Semiconductor Manufacturing Company, Ltd. - Applicants: Taiwan Semiconductor Manufacturing Company Ltd. - Inventors: Hsin-Liang Chen; Wen-Chih Wang; Chia-Hung Liao; Cheng-Chieh Chen; Yi-Ming Yeh; Hung-Ting Lin; Yung-Yao Lee - Web page: https://patentgrep.com/patent/US12191127B2 ## CPC - H01J 37/3411: {Constructional aspects of the reactor} - C23C 16/4585: {Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds} - H01J 37/32477: {characterised by the means for protecting vessels or internal parts, e.g. coatings} - H01J 37/32642: {Focus rings} - H01J 37/34: operating with cathodic sputtering (H01J37/36 takes precedence {; methods of cathodic sputtering C23C14/34}) - C23C 14/34: Sputtering - C23C 14/50: Substrate holders - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract An apparatus for PVD is provided. The apparatus includes a chamber, a pedestal disposed in the chamber to accommodate a wafer, and a ring. The ring includes a ring body having a first top surface and a second top surface, and a barrier structure disposed between the first top surface and the second top surface. The barrier structure can further include at least a first portion and a second portion separated from each other. The second vertical distance is equal to or greater than the first vertical distance. ## Claims ### Claim 1 A ring, comprising: a ring body having a first top surface, a second top surface, a first bottom surface, a second bottom surface, an innermost sidewall coupled to the first top surface and the first bottom surface, an outermost sidewall coupled to the second top surface and the second bottom surface, the first bottom surface and the second bottom surface are parallel with each other, and the first bottom surface and the second bottom surface form a step height; a barrier structure disposed between the first top surface and the second top surface; and an insulating film over the barrier structure, wherein the first top surface and the second top surface of the ring body are free of the insulating film, and the insulating film comprises aluminum oxide or aluminum nitride, wherein the barrier structure comprises at least a first portion and a second portion, wherein the second portion is between the outermost sidewall and the first portion, the first portion and the second portion are separated by a first horizontal distance, a first vertical distance is defined between a top surface of the first portion and a top surface of the second portion, and the top surface of the second portion is higher than the top surface of the first portion, and wherein the top surface of the first portion of the barrier structure, the top surface of the second portion of the barrier structure and the first top surface of the ring body are higher than the second top surface of the ring body, wherein the insulating film over the first portion of the barrier structure entirely overlaps the first bottom surface, and wherein the insulating film is disposed over the first portion and the second portion of the barrier structure, and a lower surface of a first groove between the first portion and the second portion of the barrier structure is free of the insulating film. ### Claim 2 (depends on 1) The ring of claim 1, wherein the first top surface is an annular surface, the first portion of the barrier structure is an annular portion surrounding the first top surface, the second portion of the barrier structure is an annular portion surrounding the first portion, and the second top surface is an annular surface surrounding the first top surface and the barrier structure. ### Claim 3 (depends on 1) The ring of claim 1, wherein the first top surface and the first portion of the barrier structure are separated by a second horizontal distance. ### Claim 4 (depends on 3) The ring of claim 3, wherein the first horizontal distance and the second horizontal distance are the same. ### Claim 5 (depends on 1) The ring of claim 1, wherein a second vertical distance is defined between the first top surface and the top surface of the first portion of the barrier structure. ### Claim 6 (depends on 5) The ring of claim 5, wherein the first vertical distance and the second vertical distance are the same. ### Claim 7 (depends on 1) The ring of claim 1, wherein the first vertical distance and the second vertical distance are different. ### Claim 8 (depends on 1) The ring of claim 1, wherein the ring body and the barrier structure comprise a conductive material. ### Claim 9 (depends on 1) The ring of claim 1, further comprising: a second groove between the first top surface and the first portion of the barrier structure; and. ### Claim 10 (depends on 9) The ring of claim 9, wherein the lower surface of the first groove and a lower surface of the second groove are aligned with each other. ### Claim 11 (depends on 1) The ring of claim 1, wherein a width of the first bottom surface is greater than a width of the second bottom surface.