Back to results
US 12,188,122 B2Granted
Process and device for providing vapor
AssigneeSingulus Technologies AG
InventorsOliver Hohn, Michael Reising, Johannes Grübler, Kurt Pietsch, Jörg Koch
Life of this patent
Estimating the term…
Abstract
The present invention is directed to a method and an apparatus for providing vapor for a discontinuous process.
Claims23
A method for providing vapor for a discontinuous process, the method comprising:
- flowing a liquid into a direct evaporator using a liquid metering device;
- evaporating the flowing liquid in the direct evaporator to generate a vapor;
- transporting the vapor from the direct evaporator to a process region via a storage volume, wherein a temperature of the storage volume is closed loop controllable;
- wherein a fluid connection between the storage volume and the process region is interrupted when no vapor is required in the process region, and wherein vapor continues to be generated and transported into the storage volume at least temporarily during the interruption so that a pressure within the storage volume increases during the interruption, wherein Vstorage>(Q×dt)/(pvap(T)−p0), wherein Q is a mass flow at the direct evaporator, dt is a maximum duration of the interruption, pvap(T) is a temperature-dependent vapor pressure of the flowing liquid, and p0 is an initial pressure in the direct evaporator prior to the interruption.
1 more element
A method for filling a process region with vapor from a direct evaporator that is connected with the process region via a storage volume and a fluid connection, wherein the method comprises:
- flowing a liquid into a direct evaporator using a liquid metering device;
- evaporating the flowing liquid in the direct evaporator to generate the vapor while the fluid connection between the storage volume and the process region is interrupted until a predetermined filling condition is met, wherein Vstorage>(Q×dt)/(pvap(T)−p0), wherein Q is a mass flow at the direct evaporator, dt is a maximum duration of the interruption, pvap(T) is a temperature-dependent vapor pressure of the flowing liquid, and p0 is an initial pressure in the direct evaporator prior to the interruption;
- restoring the fluid connection between the storage volume and the process region;
- and
- filling the process region with vapor.
2 more elements
A method for filling a process region with vapor from a direct evaporator that is connected with the process region via a storage volume and a fluid connection, wherein the method comprises:
- flowing a liquid into a direct evaporator using a liquid metering device;
- evaporating the flowing liquid in the direct evaporator to generate the vapor while the fluid connection between the storage volume and the process region is interrupted until a predetermined filling condition is met, wherein (VK*pp)/(Vstorage*pmax)<20, wherein VK is a volume of the process region, pp is a partial pressure of the flowing liquid in the process region, and pmax is a maximum pressure in the storage volume;
- restoring the fluid connection between the storage volume and the process region;
- and
- filling the process region with vapor.
2 more elements
Dependencies are inferred from the claim text.