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US 12,187,943 B2Granted
Chemical solution used for cleaning or etching ruthenium-containing layer and method for fabricating ruthenium wiring
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsYukihisa Wada, Shinya Koga, Kazuhiro Takahashi
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Abstract
A chemical solution used for cleaning or etching a ruthenium-containing layer, which can obtain the ruthenium-containing layer having a reduced surface roughness while maintaining a good etching rate against the ruthenium, and a method for fabricating ruthenium wiring. The chemical solution includes orthoperiodic acid, a base component, and any one of a nitrogen-containing heterocyclic compound, an organic phosphonic acid, and an organic carboxylic acid.
Claims11
A chemical solution for use in cleaning or etching a ruthenium-containing layer, comprising:
- orthoperiodic acid (A);
- a base component (B);
- and
- a compound (C) selected from the group consisting of a nitrogen-containing heterocyclic compound, an organic phosphonic acid, and an organic carboxylic acid,
- wherein the base component (B) does not correspond to any one of the compound (C), a pH buffer component (D), and an organic amine oxide (E).
2 more elements
Dependencies are inferred from the claim text.