Semiconductor process system and method

A method, comprising:

• storing a first mask in a mask container;
• selecting the mask container from a plurality of mask containers according to a first identification code on the mask container, wherein the first identification code is configured to indicate an identity of the first mask;
• comparing the first identification code and a second identification code on the first mask;
• performing a photolithography process with the first mask in response to the first identification code matching the second identification code;
• disposing a third identification code, which is separated from the second identification code, on the first mask;
• providing a part of information by each of the third identification code and the second identification code;
• and
• identifying the first mask having a pattern corresponding to the part of information for the photolithography process.

A method, comprising:

• reading a first identification code on a first mask to distinguish the first mask from a second mask;
• reading a second identification code on the second mask to identify that the second mask has a first pattern, when the second identification code is the same as a third identification code on the first mask, wherein part of information of the first identification code is provided by the third identification code, and is configured to indicate the first mask having the first pattern;
• and
• forming a semiconductor device according to the first mask having the first pattern, in a photolithography process.