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US 12,183,551 B2Granted
Gas nozzle, manufacturing method of gas nozzle, and plasma treatment device
AssigneeKYOCERA Corporation
InventorsYukio Noguchi, Tomoya Sahashi
Life of this patent
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Abstract
A gas nozzle according to the present disclosure includes a supply hole having a tubular shape and configured to guide a gas and an injection hole connecting to the supply hole. The gas nozzle configured to inject the gas from the injection hole is made from ceramics or single crystal including an oxide, a fluoride, or an oxyfluoride of a rare earth element or an yttrium aluminum composite oxide as a primary component. An arithmetic mean roughness Ra of an inner circumferential surface forming the supply hole is smaller on an outflow side than on an inflow side of the gas.
Claims8
A gas nozzle, comprising:
- a supply hole having a tubular shape and configured to guide a gas;
- and
- an injection hole connecting to the supply hole,
- wherein a central axis of the injection hole extends in a different direction from a central axis of the supply hole,
- wherein the gas nozzle configured to inject the gas from the injection hole is made from ceramics or single crystal including an oxide, a fluoride, or an oxyfluoride of a rare earth element or an yttrium aluminum composite oxide as a primary component, and
- an arithmetic mean roughness Ra of an inner circumferential surface of the supply hole on an outflow side of the supply hole is smaller than an arithmetic mean roughness Ra of an inner circumferential surface of the supply hole on an inflow side.
3 more elements
Dependencies are inferred from the claim text.