# US 12,183,543 B2 · Multi-modal operations for multi-beam inspection system > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,183,543 B2 - Document ID: US12183543B2 - Status: Granted - Kind: B2 - Application number: 17/785,890 - Filed: 2020-12-18 - Published: 2023-01-19 - Granted: 2024-12-31 - Earliest claimed: 2019-12-20 - Assignees: ASML Netherlands B.V. - Applicants: Asml Netherlands B.V. - Inventors: Martinus Gerardus Johannes Maria Maassen - Web page: https://patentgrep.com/patent/US12183543B2 ## CPC - H01J 37/28: with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} - H01J 37/045: {Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge} - H01J 2237/0435: Multi-aperture - H01J 2237/0453: multiple apertures - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract Apparatuses, systems, and methods for multi-modal operations of a multi-beam inspection system are disclosed. An apparatus for generating multi-modal beamlets may include an aperture array which includes a first group of apertures having a first size and a second group of apertures having a second size different from the first size, the second group of apertures adjoining the first group of apertures, in which the first group of apertures and the second group of apertures are in different pass-or-block statuses. A multi-beam apparatus of multi-modal inspection operations may include the aforementioned apparatus, a source configured to emit charged particles, a condenser system configured to set a projection area of the charged particles, and circuitry for controlling the first and second groups of apertures. ## Claims ### Claim 1 An apparatus comprising: an aperture array comprising: a first group of apertures having a first size, and a second group of apertures having a second size different from the first size; and wherein the first group of apertures and the second group of apertures are configured to operate in different pass-or-block statuses, and wherein an aperture in a pass status enables a beam to pass through the aperture, and the aperture in a block status stops the beam from passing through the aperture. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein the aperture array is a micro-electromechanical systems aperture array. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein the first size of the first group of apertures is larger than the second size of the second group of apertures. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the second group of apertures surrounds the first group of apertures. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein the first group of apertures is at a center of the aperture array. ### Claim 6 (depends on 1) The apparatus of claim 1, wherein when the apparatus is configured to operate in a first mode, the first group of apertures are configured to operate in the pass status, and the second group of apertures are configured to operate in the block status. ### Claim 7 (depends on 1) The apparatus of claim 1, wherein when the apparatus is configured to operate in a second mode, the first group of apertures are configured to operate in the block status, and the second group of apertures are configured to operate in the pass status. ### Claim 8 (depends on 1) The apparatus of claim 1, wherein the aperture array comprises a third group of apertures having a third size smaller than the second size. ### Claim 9 (depends on 8) The apparatus of claim 8, wherein the third group of apertures surrounds the second group of apertures. ### Claim 10 (depends on 8) The apparatus of claim 8, wherein: when the apparatus is configured to operate in a first mode, the first group of apertures are configured to operate in the pass status, and the second group of apertures and the third group of apertures are configured to operate in the block status, when the apparatus is configured to operate in a second mode, the second group of apertures are configured to operate in the pass status, and the first group of apertures and the third group of apertures are configured to operate in the block status, and when the apparatus is configured to operate in a third mode, the third group of apertures are configured to operate in the pass status, and the first group of apertures and the second group of apertures are configured to operate in the block status. ### Claim 11 A method for multi-modal operations of a multi-beam inspection system, the method comprising: receiving charged particles in the multi-beam inspection system; and based on an operation mode of the multi-beam inspection system, generating beamlets using an aperture array by controlling a subset of apertures to be in a pass status to enable beamlets to pass through the subset of apertures, and controlling apertures other than the subset of apertures in the aperture array to be in a block status to stop beamlets from passing through the apertures other than the subset of apertures. ### Claim 12 (depends on 11) The method of claim 11, further comprising: controlling a condenser system to set a projection area of the charged particles to cover the subset of apertures. ### Claim 13 (depends on 11, 12) The method of claim 11 or 12, wherein the aperture array comprises a first subset of apertures having a first size and a second subset of apertures having a second size different from the first size. ### Claim 14 (depends on 13) The method of claim 13, wherein the second subset of apertures surrounds the first subset of apertures. ### Claim 15 A non-transitory computer-readable medium that stores a set of instructions that is executable by at least one processor of an apparatus to cause the apparatus to perform multi-modal operations of a multi-beam inspection system, the multi-modal operations comprising: selecting an operation mode of the multi-beam inspection system; and based on the selected operation mode of the multi-beam inspection system; generating beamlets using an aperture array by controlling a first set of apertures of the aperture array to operate in a pass status to enable beamlets to pass through the first set of apertures; and controlling a second set of apertures of the aperture array to operate in a block status to stop beamlets from passing through the second set of apertures.