# US 12,181,800 B2 · Resist composition and resist pattern forming method

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- Number: US 12,181,800 B2
- Document ID: US12181800B2
- Status: Granted
- Kind: B2
- Application number: 17/273,669
- Filed: 2019-08-29
- Published: 2021-12-23
- Granted: 2024-12-31
- Earliest claimed: 2018-09-14
- Assignees: Tokyo Ohka Kogyo Co., Ltd.
- Applicants: Tokyo Ohka Kogyo Co., Ltd.
- Inventors: Tsuyoshi Nakamura; Yosuke Suzuki; JunYeob Lee
- Web page: https://patentgrep.com/patent/US12181800B2

## CPC

- G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}
- G03F 7/0048: {characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents}
- G03F 7/0397: {the macromolecular compound having an alicyclic moiety in a side chain}
- G03F 7/20: Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00)
- G03F 7/26: Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence)
- G03F 7/322: {Aqueous alkaline compositions}
- G03F 7/325: {Non-aqueous compositions}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A resist composition including a base material component (A), an acid generator component (B), and a mixed solvent (S) in which an organic solvent (S1) represented by Formula (s1) is mixed, in which the acid generator component (B) contains a compound (B1) represented by Formula (b1). In the formula, Rb1 represents an aryl group. Rb2 and Rb3 each independently represent an aliphatic hydrocarbon group. Lb1, Lb2, and Lb3 each independently represent a divalent linking group or a single bond. X− represents a counter anion. R1 and R2 each independently represent an alkyl group having 1 to 6 carbon atoms

## Claims

### Claim 1

A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition comprising:
a base material component (A) whose solubility in a developing solution is changed due to the action of an acid;
an acid generator component (B) which generates an acid upon light exposure; and
a mixed solvent(S) comprising methyl 2-hydroxyisobutyrate in a range of 10% by weight to 30% by weight,
wherein the acid generator component (B) contains a compound (B1) represented by Formula (b1),
wherein Rb1 represents an aryl group which may have a substituent, Rb2 and Rb3 each independently represents an aliphatic hydrocarbon group, Rb2 and Rb3 may be bonded to each other to form a ring structure, Lb1, Lb2, and Lb3 each independently represents a divalent linking group or a single bond, and X− represents a counter anion.

### Claim 2 (depends on 1)

A resist pattern forming method comprising:
forming a resist film on a support using the resist composition according claim 1;
exposing the resist film to light; and
developing the exposed resist film to form a resist pattern.