# US 12,181,795 B2 · Method for manufacturing an active structure for a radiation detector and polymeric mold for the method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,181,795 B2 - Document ID: US12181795B2 - Status: Granted - Kind: B2 - Application number: 17/846,136 - Filed: 2022-06-22 - Published: 2023-12-28 - Granted: 2024-12-31 - Earliest claimed: 2022-06-22 - Assignees: Ecole Polytechnique Federale De Lausanne (Epfl) - Applicants: Ecole Polytechnique Federale De Lausanne (Epfl) - Inventors: Veronica Leccese; Michele Caldara; Marcello Pagano; Arnaud Bertsch; Luca Müller; Alessandro Mapelli; Fabrizio Carbone - Web page: https://patentgrep.com/patent/US12181795B2 ## CPC - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - B29C 33/40: Plastics, e.g. foam or rubber - C08L 83/04: Polysiloxanes - G01T 1/20: with scintillation detectors - G01T 1/29: Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation - C08L 2203/20: use in electrical or conductive gadgets - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00) - C08L: COMPOSITIONS OF MACROMOLECULAR COMPOUNDS (compositions based on polymerisable monomers C08F, C08G; artificial filaments or fibres D01F; textile treating compositions D06) - G01T: MEASUREMENT OF NUCLEAR OR X-RADIATION (radiation analysis of materials, mass spectrometry G01N23/00; tubes for determining the presence, intensity, density or energy of radiation or particles H01J47/00) ## Abstract A method for manufacturing a scintillation detector structure including the steps of forming a plurality of first structures into a surface of a substrate to form a patterned substrate, filling the plurality of first structures and covering the surface of the substrate with a polymeric material, hardening the polymeric material and first removing the hardened polymeric material from the substrate to obtain a polymeric mold with a patterned surface having a plurality of second structures, performing a surface cleaning treatment and a silanization of the patterned surface of the polymeric mold, filling the plurality of second structures and covering the patterned surface of the polymeric mold with a moldable scintillation material, polymerizing the scintillation material while exerting a pressure on the scintillation material, and second removing the polymerized scintillation material from the plurality of second structures of the polymeric mold to obtain scintillation detector active structures. ## Claims ### Claim 1 A method for manufacturing a scintillation detector structure comprising: forming a plurality of first structures into a surface of a substrate to form a patterned substrate; filling the plurality of first structures and covering the surface of the substrate with a polymeric material; hardening the polymeric material and first removing the hardened polymeric material from the patterned substrate to obtain a polymeric mold with a patterned surface having a plurality of second structures; performing a surface cleaning treatment and a silanization of the patterned surface of the polymeric mold; filling the plurality of second structures and covering the patterned surface of the polymeric mold with a moldable scintillation material; polymerizing the scintillation material while exerting a pressure on the scintillation material; and second removing the polymerized scintillation material from the plurality of second structures of the polymeric mold to obtain scintillation detector active structures. ### Claim 2 (depends on 1) The method of claim 1, wherein the polymeric material includes Polydimethylsiloxane (PDMS). ### Claim 3 (depends on 1) The method of claim 1, wherein the step of filing is performed by pouring or by spin-coating. ### Claim 4 (depends on 1) The method of claim 1, wherein the step of first removing is performed by demolding the hardened polymeric material from the patterned substrate by peeling. ### Claim 5 (depends on 1) The method of claim 1, wherein the step of second removing is performed by demolding the polymerized scintillation material. ### Claim 6 (depends on 1) The method of claim 1, wherein the step of second removing is performed by dissolving the polymeric mold with a solvent. ### Claim 7 (depends on 1) The method of claim 1, wherein performing the surface cleaning treatment includes an oxygen plasma treatment. ### Claim 8 (depends on 1) The method of claim 1, wherein the performing the silanization of the patterned surface of the polymeric mold is done by using a perfluoro-terminated silane to increase a hydrophobicity of the patterned surface of the polymeric mold creating a fluorinated monolayer. ### Claim 9 (depends on 1) The method of claim 1, wherein the step of forming the plurality of first structures includes a photolithography process to form the first structures. ### Claim 10 (depends on 1) The method of claim 1, wherein the first and second structures include channels, and the scintillation detector active structures include scintillator columns. ### Claim 11 (depends on 1) The method of claim 1, wherein the first and second structures include grids, and the scintillation detector active structures include scintillator grids. ### Claim 12 (depends on 1) The method of claim 1, wherein the scintillation detector active structures do not have a cladding layer. ### Claim 13 (depends on 1) A scintillation detector structure manufactured by the method of claim 1.